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Research Programmes

 

Fabrication and Characterisation of Nanostructures

  Prof. RNDr. Tomaš Šikola, CSc.
Research Group Leader           

 

THEMATIC RESEARCH FOCUS

RESEARCH AREAS

  • Fabrication of nanostructures by bottom-up methods
  • Fabrication of nanostructures by top-down methods (nanolithography)
  • Investigation of the functional properties of nanostructures
  • The development of analytical and measurement methods

MAIN OBJECTIVES

Fabrication of nanostructures by bottom-up and top-down methods (nanolithography)

Development of methods on nanostructure fabrication: planar physical and plasmochemical methods using EBL, UV lithography, FIB, SPM lithography, imprint technology. MBE, CVD, ALD, PECVD, hybrid methods for selective growths, etc. All the developed methods will be utilised directly for fabrication of nanostructures, advanced planar materials and devices.

Investigation of the functional properties of nanostructures

Specification and optimisation of the functional properties of nanostructures for nanoelectronics, nanophotonics and (bio)sensing their correlation with geometrical/structural parameters of nanostructures and operational parameters. Novel and unique properties of nanostructures not observable at conventional materials and microstructures open the ways for qualitatively new applications.

Research and development of analytical and measurement methods

Development of the techniques and methodologies for microscopy, analysis and metrology of nanomaterials/nanostructures, and for diagnostics of their properties – new techniques of nanometrology by SPM, optical methods, combination of more techniques (SEM, AFM, etc.). This will be used for meeting the other objectives of the Advanced Nanotechnologies and Microtechnologies Research Programme and characterisation of nanoand micro-structures generally.

CONTENT OF RESEARCH

Fabrication of nanostructures by bottom-up methods

Fabrication of nanostructures by planar technologies

Research and utilisation of phenomena essential for the growth of (ultra)thin fi lms and self-assembling of nanoobjects (nanofi bres, nanotubes, nanodots etc.) with specifi c properties using PVD (MBE, IBAD, magnetron sputtering), CVD, PECVD and (electro)chemical methods. Attention will be paid both to the study of the initial stages of the growth of thin fi lms and nanostructures that are of vital importance for the parameters and properties of the fi nal products (substrate infl uence, nucleation, diff usion, growth modes, catalyst activity), and to fi nding the relationships between the parameters and the properties of these products. Selective and guided growth of nanostructures on the substrates patterned by lithographic methods.

Research on the fabrication of nanofibres (especially metallic) from electrolytic solutions using e.g. polymeric matrices (templates) such as membranes. The development of the methods of assembling nanofibres using electrophoresis, etc.

Fabrication of nanostructures by top-down methods (nanolithography)

The development of nanolithographic methods by means of electron beam lithography, scanning probe microscopy (e.g. local anodic oxidation), focussed ion beam and their combinations with planar technologies (e.g. selective and guided growth, respectively) for the fabrication of nanostructures with minimum dimensions as close to 10 nm as possible.

  • Fabrication of nanoelements and nanodevices (quantum point contacts, rings and dots, SETs, spintronics systems, etc.)
  • Fabrication of ordered metallic nanoparticles, elements and systems (plasmonics, resonance plasmonic antennas, etc.)
  • Fabrication of ordered dielectric and semiconductor nanodots and nanowires (photonics, optoelectronics, bioactive surfaces)
  • Fabrication of metallic nanoelectrodes for making contacts to molecular nanostructures and nanoelements
  • Fabrication of novel masks (e.g. from SAM), the application of self assembling and electrochemical methods

Investigation of the functional properties of nanostructures

The main goal is to find the correlation between the properties and the geometrical and structural parameters of nanostructures and to use this knowledge for feedback in the technology of their preparation and for various applications.

Magnetic nanostructures

The fabrication of magnetic 2D-0D ordered nanostructures and ultrathin layered structures utilising the combination of 3D metals and nonmagnetic materials. An experimental and theoretical study of magnetic anisotropy, transport properties (e.g. GMR, TMR) and the dynamics of domain walls and vortexes for applications in magnetic recording, sensing and spintronics.

Nanostructures for plasmonics

The fabrication and study of the properties of metallic nanostructures and microstructures suitable for plasmonics. Research on the generation, detection and application of surface plasmon polaritons. Simulation and experimental verification of localised surface resonances (localised surface plasmons) on metallic nanoparticles, nanowires and nano/micro antennas. The influence of dielectric materials (spacers) between metallic components of plasmonic structures. Applications in micro and nanosensors (including biosensors).

Ultrathin films and nanostructures of wide-band gap semiconductors

The fabrication of semiconductor nitride ultrathin films and nanostructures (GaN, AlN) at low and medium temperatures. A study of their electronic structure. The electric transport properties and optoelectronic properties of 0D nanostructures.

KEY RESEARCH EQUIPMENT

PLANNED RESEARCH INFRASTRUCTURE

Core Facilities

The research group will be one of the principal users of the equipment available within CEITEC Nanolithography and Nanofabrication and Nanocharacterisation Core Facilities.

CURRENT RESEARCH INFRASTRUCTURE

The experimental facilities of the group are mostly located in clean rooms (class < 100 000). They cover the techniques as follows:

Dual ion beam HV apparatus for ion-beam assisted deposition and ion-beam etching; complex UHV apparatus for deposition and in situ analysis of ultrathin fi lms with four effusion cells for molecular beam deposition, a hyperthermal ion-beam source for direct ion beam deposition, and surface analytical techniques (SIMS, TOF-LEIS, XPS, TDS, LEED, RHEED, spectroscopic ellipsometry); two commercial scanning probe microscopes (AutoProbe Veeco, NT-MDT Ntegra) providing various modes such as AFM, LFM, conductive AFM, EFM, Kelvin probe, nanolithography mode and in case of NT-MDT microscope also a near fi eld mode (SNOM) providing illumination and collection operational regimes both in refl ection or transmission (inverted microscope) measuring schemes; microrefl ection spectrometer; a setup for magnetooptical Kerr eff ect, etc. Other instruments like standard and confocal optical microscopes and a scanning electron microscope with a lithographic option (Tescan – Vega) are available in the labs outside of the clean rooms.

MAIN PROJECTS

  • Plasmon antenna resonances investigated using Electron Energy Loss Spectroscopy, Royal Society, 2009-2011, T. Šikola, Brno University of Technology, S. Maier, Imperial College.
  • Structures for nanophotonics and nanoelectronics (LC06040), Ministry of Education, Youth and Sports, 2006-2011, T. Šikola, Brno University of Technology, A. Fejfar, Institute of Physics AS CR.
  • Functional hybrid nanosystems of semiconductors and metals with organic materials (KAN400100701), Academy of Sciences of the Czech Republic, 2007-2011, B. Rezek, Institute of Physics AS CR, L. Kotačka, OPTAGLIO, Ltd., S. Kmoch, Charles University in Prague, T. Šikola, Brno University of Technology, P. Maly, Charles University in Prague.
  • Inorganic nanomaterials and nanostructures: fabrication, characterisation, properties (MSM0021630508), Ministry of Education, Youth and Sports, 2005-2011, J. Cihlař, Brno University of Technology.

SELECTED PUBLICATIONS

  • KOLIBAL, M., MATLOCHA, T., VYSTAVEL, T., SIKOLA, T. Low energy focused ion beam milling of silicon and germanium nanostructures. Nanotechnology. 2011, 22(10), p. 105304-105311.
  • URBANEK, M., UHLIR, V., BABOR, P., KOLIBALOVA, E., HRNCIR, T., SPOUSTA, J., SIKOLA, T. Focused ion beam fabrication of spintronic nanostructures: an optimization of the milling process. Nanotechnology. 2010, 21(14), p. 145304-145310.
  • BARTOSIK, M., KOLIBAL, M., CECHAL, J., MACH, J., SIKOLA, T. Selective growth of metallic nanostructures on surfaces patterned by AFM local anodic oxidation. J. Nanosci. Nanotechnology. 2009, 9(10), p. 5887-5890.
  • SIKOLA, T., KEKATPURE, R., D., BARNARD, E., S., WHITE, J., S., VAN DORPE, P., BRINEK, L., TOMANEC, O., ZLAMAL, J., LEI, D., SONNEFRAUD, Y., MAIER, S., A., HUMLICEK, J., BRONGERSMA, M., L. Mid – IR plasmonic antennas on silicon-rich oxinitride absorbing substrates: nonlinear scaling of resonance wavelengths with antenna length. Appl. Phys. Lett. 2009, 95(25), p. 253109-253111.
  • KOLIBAL, M., CECHAL, T., BRANDEJSOVA, E., CECHAL, J., SIKOLA, T. Self-limiting cyclic growth of gallium droplets on Si(111). Nanotechnology. 2008, 19(46), p. 475606-475610.