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Research Programmes

 

Plasma Technologies

Doc. Mgr. Lenka Zajíčková, Ph.D.
Research Group Leader

THEMATIC RESEARCH FOCUS

RESEARCH AREAS

  • Plasmachemical and chemical processes for synthesis and functionalisation of carbon nanostructured materials
  • Plasma deposition of protective and barrier coatings
  • Plasmachemical processes for synthesis of metal and metal oxide nanoparticles
  • Development of models and software for the analysis of optical measurements on thin films and surfaces
  • Development of software for scanning probe microscopy (SPM) data visualisation and analysis
  • Mechanical and tribological tests of thin fi lms and nanostructured materials

MAIN OBJECTIVES

Fabrication of nanostructures by bottom-up and top-down methods (nanolithography)

Development and understanding of methods for the fabrication of nanostructured and advanced materials. The methods studied cover plasma-related technologies (PECVD, magnetron sputtering, plasma treatment), some physical and chemical vapour techniques (evaporation, MBE, CVD), lithography and FIB. Carbon nanostructured materials, protective and barrier coatings and metal-based nanoparticles will be prepared by these methods.

The development of submicron devices and nanostructures

Development of methods and techniques for implementation of materials prepared in the frame of above mentioned objectives into higher functional integrated systems, especially electronic circuits on a chip, nano- and

micro-electromechanical systems (MEMS/NEMS) and sensors. Development of libraries for the design of integrated systems and their fabrication using CEITEC planar technologies. Nanostructures implemented into these systems will enhance the performance and effi ciency of current devices and systems and widen the areas of their applications (e.g. biosensors, biochips, biorecognition tranducers).

Research and development of analytical and measurement methods

Development of techniques and methodologies for microscopy, analysis and metrology of nanomaterials/nanostructures, and for diagnostics of their properties – software for SPM data visualisation and analysis, methodologies and software for the characterisation by optical methods in a wide spectral range investigation of methods for the determination of tribological and mechanical properties. These methods will be combined with other analytical methods for meeting the objectives of the Advanced Nanotechnologies and Microtechnologies Research Programme and characterisation of nano- and micro-structures in general.

CONTENT OF RESEARCH

Fabrication of nanostructures by bottom-up methods

Plasmachemical and chemical processes for synthesis and functionalisation of carbon nanostructured materials

Research group investigate plasmachemical and chemical methods for the synthesis and functionalisation of carbon nanotubes (CNTs), carbon nanowalls (CNWs) and graphene. A part of this objective is to develop perspective plasmachemical methods for synthesis at atmospheric pressure using plasma discharges such as mw plasma torch, dielectric barrier discharge and/or rf plasma jet. However, more conventional approaches using thermal chemical vapour deposition (CVD) and low pressure plasma enhanced CVD (PECVD) will be also investigated. Among others, the research is focussed on the understanding of processes that take place during the activation of the catalyst and initial phase of the CNT/CNWs growth. It includes the role of catalyst supportive material on the growth. The motivation is highlighted by the fact that groups preparing CNTs and CNWs report varying success in similar plasma conditions. The research covers also the deposition of CNTs on conductive substrates. Second part of this topic is devoted to the understanding of plasmachemical processes of functionalisation and polymer grafting of CNTs or graphene and their demonstration as advantageous alternative to conventional chemical processes. The understading of all the plasmachemical processes is achieved by application of plasma diagnostics tools and numerical simulations.

Plasma deposition of nanocomposite and multilayered thin films

Plasma enhaced CVD and magnetron sputtering (PVD) methods is used and investigated for the deposition of carbon-based and hybrid organic-inorganic nanocomposites and multilayered thin films. The aim is to tune material properties by fine adjustment of material nanostructure (nanoparticles embedded in different matrix or thin film multilayer structure). We study influence of process parameters (substrate influence, growth modes, plasma parameters) on the material properties and find their relationship. Furthermore, we use the effects of structural self-organisation by selection of gaseous precursors for example from the linear, cyclic or 3D organosilicons (silicates, siloxanes and silsesquioxanes).

Plasmachemical synthesis of metal and metal oxide nanoparticles

Plasmachemical processes are investigated with the aim to synthesise metal and metal oxide nanoparticles with desired phase and size distribution. This research is focussed on the synthesis of iron oxide nanoparticles that find many applications.

Development of nanostructures by “top-down” methods (nanolithography)

Our goal is to develop procedures for positioning of carbon nanotubes by pattering the catalyst. Besides UV and e-beam lithography, the research includes an approach compatible with thick film technology (TFT) and direct patterning by microplasma. The positioning of CNTs also covers the investigation of their manipulation and transfer. We research the preparation of metalic electrodes for contacting the structures prepared in work package Fabrication of nanostructures by ”bottom-up” methods and structures with final application as sensors.

Research and development of submicron systems and nanodevices

The processes and materials developed in previous two work packages will be applied for preparation of micro and nano-devices with applications in sensing, diagnostics, MEMS etc. Especially, research group will work on the integration of carbon nanotubes, iron oxide nanoparticles and hard low-friction coefficient thin films into these devices.

Development of instruments and methods for investigation of nanomaterials and nanostructures

Research group develop methodologies and software for the characterization of nanomaterials/nanostructures by optical methods (reflectance, transmittance and elipsometry) in a wide spectral range from vacuum ultraviolet (VUV) to infrared (IR). The dispersion models are based on parametrization of the density of states of the material and, therefore, provide information also about the band structure of the material. The software includes various film inperfections (nonuniformity, inhomogeneity, anisotropy, transitional layers etc.) and systematic measurement errors (substrate back-side reflection, non-monochromaticity of light etc.). The analysis of optical measurements in a wide spectral range by the models parametrizing density of states of the material and taking into account various film inperfections (nonuniformity, inhomogeneity, anisotropy, transitional layers etc.) provide unique information not only about material dielectric function but also about its structure. Further development of these models requires their testing on different samples that will be provided in the frame of work package Fabrication of nanostructures by ”bottom–up” methods.

Research group develop the software Gwyddion for SPM (scanning probe microscopy) data visualization and analysis, primarly intended for analysis of height fields obtained by scanning probe microscopy techniques (AFM, MFM, STM, SNOM/NSOM). This activity is carried out in close collaboration with the CEITEC Development of Methods for Analysis and Measuring research group.

Research group investigates methods for the determination of tribological and mechanical properties. The attention is focused to the evaluation of micro- and nano-indentation data. The assignment of various deformation mechanisms and failure onsets to the appearance of pop-ins and slope discontinuities in load-penetration dependences are carried out on the basis of a complex analysis of mutual relations between the nanoindentation response and the structure of studied materials. Software for numerical evaluation of the loading response taking into account the onset of sub-surface failures is developed and new models for evaluation of mechanical properties of multilayered and nanocomposite systems are tested.

Characterisation of nano- and micro-structures and materials by all the above methods are combined with other analytical methods for obtaining complete information about the material properties and the applicability of various methods.

KEY RESEARCH EQUIPMENT

PLANNED RESEARCH INFRASTRUCTURE

Core Facilities

The research group will be one of the principal users of the equipment available within CEITEC Nanolithography and Nanofabrication and Nanocharacterisation Core Facilities.

CURRENT RESEARCH INFRASTRUCTURE

A series of vacuum reactors for plasma-chemical deposition and magnetron sputtering; Langmuir probes, mass and energy analyser, and optical emission spectrometers for discharge diagnostics; microindenter; contact angle measurement setup; spectroscopic ellipsometry, UV/VIS/IR spectrometer, and FT-IR for thin film analysis.

MAIN PROJECTS

  • Innovation study on development of gas sensors based on CNTs, contracted research for CEDO Belgium, 2008-2009, L. Zajičkova, Masaryk University.
  • Synthesis of carbon micro- and nanostructures by plasma technologies (GA202/05/0607), Czech Science Foundation, 2005-2007, L. Zajičkova, Masaryk University, P. Klapetek, Czech Metrology Institute, J. Buršik, Institute of Physics of Materials AS CR, J. Matějkova, Institute of Scientifi c Instruments AS CR.
  • Deposition of thermomechanically stable nanostructured diamond-like thin fi lms in dual frequency capacitive discharges (GA202/07/1669), Czech Science Foundation, 2007-2011, V. Buršikova, Masaryk University, V. Peřina, Institute of Nuclear Physics AS CR, J. Sobota, Institute of Scientifi c Instruments AS CR, P. Klapetek, Czech Metrology Institute.
  • Plasmachemical processes for synthesis of carbon nanotubes and study of their functional properties (GAP205/10/1374), Czech Science Foundation, 2010-2014, L. Zajičkova, Masaryk University, J. Hubalek, Brno University of Technology.
  • Nanometrology using scanning probe microscopy methods (KAN311610701), Academy of Sciences of the Czech Republic, 2007-2011, P. Klapetek, Czech Metrology Institute, V. Buršikova, Masaryk University, J. Lazar, Institute of Scientifi c Instruments AS CR.

SELECTED PUBLICATIONS

  • FRANTA, D., NECAS, D., ZAJICKOVA, L., BURSIKOVA, V., COBET, C. Combination of Synchrotron Ellipsometry and Table-Top Optical Measurements for Determination of Band Structure of DLC Films. Thin Solid Films. 2011, 519(9), p. 2694-2697.
  • ZAJICKOVA, L., JASEK, O., ELIAS, M., SYNEK, P., LAZAR, L., SCHNEEWEISS, O., HANZLIKOVA, R. Synthesis of carbon nanotubes by plasma-enhanced chemical vapor deposition in an atmospheric-pressure microwave torch. Pure and Applied Chemistry. 2010, 82(6), p. 1259-1272.
  • TRUNEC, D., ZAJICKOVA, L., BURSIKOVA, V., STUDNICKA, F., STAHEL, P., PRYSIAZHNYI, V., PERINA, V., HOUDKOVA, J., NAVRATIL, Z., FRANTA, D. Deposition of hard thin fi lms from HMDSO in atmospheric pressure dielectric barrier discharge. Journal of Physics D. 2010, 43(22), p. 225403.
  • ZAJICKOVA, L., KUCEROVA, Z., BURSIKOVA, V., ELIAS, M., HOUDKOVA, J., SYNEK, P., MARSIKOVA, H., JASEK, O. Carbon Nanotubes Functionalized in Oxygen and Water Low Pressure Discharges used as Reinforcement of Polyurethane Composites. Plasma Processes and Polymers. 2009, 6(1), p. S864-S869.
  • ZAJICKOVA, L., BURSIKOVA, V., KUCEROVA, Z., FRANTA, D., DVORAK, P., SMID, R., PERINA, V., MACKOVA, A. Deposition of protective coatings in RF organosilicon discharges. Plasma Sources Sci. Technol. 2007, 16(1), p. S123-S132.
 

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