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About event
Dear CEITEC Nano users,
In the 25th – 26th of June will be held GenIsys workshop in Ceitec Nano. First day will be dedicated to short introduction / basic work with Beamer/Tracer. Second day will be dedicated to more advanced work with Beamer/Lab. Workshop will be held in the PC room at building C. There will be a license on every computer so participants will be able to control the software during function explanation.
Preliminary agenda:
| Tuesday 25th June | 13:30 – 17:00 | - Basic work with Beamer, Tracer and Lab |
| Wednesday 26th June | 9:00 – 15:00 | - Advanced work with Beamer and Lab |
Beamer = Software for data preparation for Electron beam and Laser beam lithography
Tracer = Quantification of electron scattering and process effects
Lab = Layout and process optimization for lithography technologies
Please let us know who is going to attend the workshop (day1, 2 or both) by filling registration.
This workshop is highly recommended to everyone who wants to have his/her lithography best as it could be.
Just a reminder – you can have a training for Beamer/Tracer/Lab after consultation with Robert Dóczy, so you can use it regularly.