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Imaging of near-field interference patterns by a-SNOM – influence of illumination wavelength and polarization state

OPTICS EXPRESS

DVOŘÁK, P.; ÉDES, Z.; KVAPIL, M.; ŠAMOŘIL, T.; LIGMAJER, F.; HRTOŇ, M.; KALOUSEK, R.; KŘÁPEK, V.; DUB, P.; SPOUSTA, J.; VARGA, P.; ŠIKOLA, T., 2017: Imaging of near-field interference patterns by a-SNOM – influence of illumination wavelength and polarization state. OPTICS EXPRESS 25(14), p. 16560 - 13, doi: 10.1364/OE.25.016560; FULL TEXT
(EVAPORATOR, SNOM-NANONICS, LYRA)

Equipment:

• Electron beam evaporator BESTEC
• Scanning Near-field Optical Microscopy Nanonics Imaging MV 4000
• Focused Ion Beam/Scanning Electron Microscope TESCAN LYRA3

Research Groups:

• Fabrication and Characterisation of Nanostructures
• CF: CEITEC Nano

CEITEC authors:

• Petr Dvořák, Ph.D.
• Zoltán Édes
• Michal Kvapil, Ph.D.
• Tomáš Šamořil, Ph.D.
• Filip Ligmajer, Ph.D.
• Vlastimil Křápek, Ph.D.
• Prof. Petr Dub
• Prof. Jiří Spousta, Ph.D.
• Prof. Tomáš Šikola
• Martin Hrtoň
• Radek Kalousek, Ph.D.