INFLUENCE OF UNDERLAYER ON CRYSTALLOGRAPHY AND ROUGHNESS OF ALUMINUM NITRIDE THIN FILM REACTIVELY SPUTTERED BY ION-BEAM KAUFMAN SOURCE

NANOCON 2015: 7TH INTERNATIONAL CONFERENCE ON NANOMATERIALS - RESEARCH & APPLICATION

Gablech, I; Svatos, V; Prasek, J; Hubalek, J, 2015: INFLUENCE OF UNDERLAYER ON CRYSTALLOGRAPHY AND ROUGHNESS OF ALUMINUM NITRIDE THIN FILM REACTIVELY SPUTTERED BY ION-BEAM KAUFMAN SOURCE. NANOCON 2015: 7TH INTERNATIONAL CONFERENCE ON NANOMATERIALS - RESEARCH & APPLICATION , p. 89 - 93

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