Share Share Share

Ellipsometric characterization of inhomogeneous non-stoichiometric silicon nitride films

SURFACE AND INTERFACE ANALYSIS

Necas, D; Franta, D; Ohlidal, I; Poruba, A; Wostry, P, 2013: Ellipsometric characterization of inhomogeneous non-stoichiometric silicon nitride films. SURFACE AND INTERFACE ANALYSIS 45(7), p. 1188 - 1192, doi: 10.1002/sia.5250

Research Groups:

• Development of Methods for Analysis and Measuring

CEITEC authors:

• David Nečas, Ph.D.