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Structural properties of Al2O3/AlN thin film prepared by magnetron sputtering of Al in HF-activated nitrogen plasma

THIN SOLID FILMS

Dallaeva, DS; Bilalov, BA; Gitikchiev, MA; Kardashova, GD; Safaraliev, GK; Tomanek, P; Skarvada, P; Smith, S, 2012: Structural properties of Al2O3/AlN thin film prepared by magnetron sputtering of Al in HF-activated nitrogen plasma. THIN SOLID FILMS 526(526), p. 92 - 96, doi: 10.1016/j.tsf.2012.11.023

Research Groups:

• Advanced Instrumentation and Methods for Materials Characterization