Fabrication of buried microfluidic channels with observation windows using femtosecond laser photoablation and parylene-C coating
MICROFLUIDICS AND NANOFLUIDICS
GABLECH, I.; SOMER, J.; FOHLEROVÁ, Z.; SVATOŠ, V.; PEKÁREK, J.; KURDÍK, S.; FENG, J.; FECKO, P.; PODEŠVA, P.; HUBÁLEK, J.; NEUŽIL, P., 2018: Fabrication of buried microfluidic channels with observation windows using femtosecond laser photoablation and parylene-C coating. MICROFLUIDICS AND NANOFLUIDICS 22(9), p. NA - 7, doi: 10.1007/s10404-018-2125-6; FULL TEXT
(DRIE, DWL, SUSS-MA8, PARYLENE, XEF2)
Equipment:
- Deep reactive ion etching of Si-based materials Oxford Instruments Plasma Technology PlasmaPro 100
- UV Direct Write Laser system Heidelberg Instruments DWL 66-fs
- Mask Aligner, NanoImprint Lithography SÜSS MicroTec MA8/BA8 Gen3
- SCS Parylene Deposition System
- XeF2 Etching of Silicon
Research Groups:
CEITEC authors: