Utilization of the sum rule for construction of advanced dispersion model of crystalline silicon containing interstitial oxygen

THIN SOLID FILMS

Franta, D; Necas, D; Zajickova, L; Ohlidal, I, 2014: Utilization of the sum rule for construction of advanced dispersion model of crystalline silicon containing interstitial oxygen. THIN SOLID FILMS 571, p. 490 - 495, doi: 10.1016/j.tsf.2014.03.059

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