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Large area interference lithography using a table-top extreme ultraviolet laser: a systematic study of the degree of mutual coherence

NANOTECHNOLOGY

Zuppella, P; Luciani, D; Tucceri, P; De Marco, P; Gaudieri, A; Kaiser, J; Ottaviano, L; Santucci, S; Reale, A, 2009: Large area interference lithography using a table-top extreme ultraviolet laser: a systematic study of the degree of mutual coherence. NANOTECHNOLOGY 20(11)

Research Groups:

• Advanced Instrumentation and Methods for Materials Characterization

CEITEC authors:

• Prof. Jozef Kaiser, Ph.D.