Atomic layer deposition system Ultratech/CambridgeNanoTech Fiji 200 (ALD)

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Guarantor: Mgr. Marek Eliáš, Ph.D.
Technologie / Metodologie: Etching & Deposition
Instrument status: Operational Operational, 27.2.2024 14:55
Equipment placement: CEITEC Nano - C1.34
Výzkumná skupina: CF: CEITEC Nano


Popis:

Atomic Layer Deposition is a deposition technique for very thin layers with the thickness control down to a single atomic layer. It belongs to the CVD techniques family. The thickness precision is achieved by pulsed deposition, where first a metal-containing precursor is introduced into the chamber and after a short time (allowing for monolayer adsorption) the chamber is pumped down. The following step is exposure to the oxidizing precursor (for oxides) or nitrogen-containing precursor (for nitrides). Thus, a monolayer of the target material is grown. The metal-containing precursors are usually organometallic ones, for oxidation a water or oxygen plasma can be used, nitridation is done using nitrogen plasma. To achieve the deposition in the ALD mode, the sample is heated up to a certain temperature, for most processes being in the range from 150 to 300 °C.


Publications:

  • KEPIČ, P.; LIŠKA, P.; IDESOVÁ, B.; CAHA, O.; LIGMAJER, F.; ŠIKOLA, T., 2024: Pulsed laser deposition of Sb2S3 films for phase-change tunable nanophotonics. NEW JOURNAL OF PHYSICS 26(1), p. 1 - 8, doi: 10.1088/1367-2630/ad1696; FULL TEXT
    (ICON-SPM, KRATOS-XPS, LYRA, ALD, WITEC-RAMAN, RIGAKU9, WOOLLAM-VIS)
  • Bawab, B.; Thalluri, S. M.; Kolíbalová, E.; Zazpe, R.; Jelinek, L.; Rodriguez-Pereira, J.; Macak, J. M., 2024: Synergistic effect of Pd single atoms and nanoparticles deposited on carbon supports by ALD boosts alkaline hydrogen evolution reaction. CHEMICAL ENGINEERING JOURNAL 482, doi: 10.1016/j.cej.2024.148959; FULL TEXT
    (ALD, VERIOS, TITAN, KRATOS-XPS, RIGAKU3)
  • ROVENSKÁ, K.; LIGMAJER, F.; IDESOVÁ, B.; KEPIČ, P.; LIŠKA, J.; CHOCHOL, J.; ŠIKOLA, T., 2023: Structural color filters with compensated angle-dependent shifts. OPTICS EXPRESS 31(26), p. 43048 - 9, doi: 10.1364/OE.506069; FULL TEXT
    (EVAPORATOR, MIRA-EBL, RIE-CHLORINE, ALD, SNOM-NANONICS, TUBE-FURNACE)
  • GALLINA, P.; KVAPIL, M.; LIŠKA, J.; KONEČNÁ, A.; KŘÁPEK, V.; KALOUSEK, R.; ZLÁMAL, J.; ŠIKOLA, T., 2023: Strong coupling in an Au plasmonic antenna-SiO2 layer system: A hybrid-mode analysis. PHYSICAL REVIEW B 107(12), p. 125144 - 6, doi: 10.1103/PhysRevB.107.125144; FULL TEXT
    (ALD, EVAPORATOR, MIRA-EBL, FTIR, NANOCALC, DEKTAK, WOOLLAM-MIR, ICON-SPM)
  • Idesová, B., 2023: Design and fabrication of dielectric metasurfaces for ultraviolet wavelengths. MASTER´S THESIS , p. 1 - 71; FULL TEXT
    (EVAPORATOR, ALD, RAITH, NANOCALC, SCIA)

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