Atomic layer deposition system Ultratech/CambridgeNanoTech Fiji 200 (ALD)

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Guarantor: Marek Eliáš, Ph.D.
Technology / Methodology: Etching & Deposition
Instrument status: Operational Operational, 6.4.2020 14:41
Equipment placement: CEITEC Nano - C1.34
Research group: CF: CEITEC Nano


Detailed description:

Atomic Layer Deposition is a deposition technique for very thin layers with the thickness control down to a single atomic layer. It belongs to the CVD techniques family. The thickness precision is achieved by pulsed deposition, where first a metal-containing precursor is introduced into the chamber and after a short time (allowing for a monolayer adsorption) the chamber is pumped down. Following step is an exposure to the oxidizing precursor (for oxides) or nitrogen containing precursor (for nitrides). Thus, a monolayer of target material is grown. The metal-containing precursors are usually organometallic ones, for oxidation a water or oxygen plasma can be used, nitridation is done using water or nitrogen plasma. To achieve the deposition in the ALD mode, sample is heated up to a certain temperature, for most processes being in the range from 150 to 300 °C.


Publications:

  • Fecko, P., 2019: Gecko mimicking surfaces. MASTER´S THESIS , p. 1 - 52
    (SUSS-RCD8, SUSS-MA8, DWL, DRIE, LYRA, ALD, RIE-FLUORINE, ICON-SPM)
  • Hrdy, R; Prasek, J; Fillner, P; Vancik, S; Schneider, M; Hubalek, J; Schmid, U, 2019: Development of HfO2/Al2O3 Stack for On-Chip Capacitor Applications. 2019 42ND INTERNATIONAL SPRING SEMINAR ON ELECTRONICS TECHNOLOGY (ISSE)
    (ALD)
  • Pokorný, D., 2019: Morphology study of ultra thin layers by XPS analysis of multiple peaks of a single element. MASTER´S THESIS , p. 1 - 71
    (KRATOS-XPS, WOOLLAM-VIS, ALD)
  • Kaushik, P.; Eliáš, M.; Michalička, J.; Hegemann, D.; Pytlíček, Z.; Nečas, D.; Zajíčková, L., 2019: Atomic layer deposition of titanium dioxide on multi-walled carbon nanotubes for ammonia gas sensing. SURFACE AND COATINGS TECHNOLOGY 370, p. 235 - 243, doi: 10.1016/j.surfcoat.2019.04.031
    (ALD, EVAPORATOR, PECVD-NANOFAB, WOOLLAM-VIS, RIGAKU3, KRATOS-XPS, VERIOS, TITAN)
  • Kaushik, P.; Elias, M.; Prasek, J.; Pytlicek, Z.; Zajickova, L., 2018: Titanium dioxide modified multi-walled carbon nanotubes as room temperature NH3 gas sensors. PROCEEDINGS PAPER: 17TH IEEE SENSORS CONFERENCE , p. 959 - 961
    (ALD, TERS, LYRA)

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