Atomic layer deposition system Ultratech/CambridgeNanoTech Fiji 200 (ALD)

Atomic layer deposition system Ultratech/CambridgeNanoTech Fiji 200
CONTACT US

Guarantor: Marek Eliáš, Ph.D.
Technology / Methodology: Etching & Deposition
Instrument status: Operational Operational, 23.4.2019 10:18, problem with loadlock
Equipment placement: CEITEC Nano - C1.34
Research group: CF: CEITEC Nano


Detailed description:

Atomic Layer Deposition is a deposition technique for very thin layers with the thickness control down to a single atomic layer. It belongs to the CVD techniques family. The thickness precision is achieved by pulsed deposition, where first a metal-containing precursor is introduced into the chamber and after a short time (allowing for a monolayer adsorption) the chamber is pumped down. Following step is an exposure to the oxidizing precursor (for oxides) or nitrogen containing precursor (for nitrides). Thus, a monolayer of target material is grown. The metal-containing precursors are usually organometallic ones, for oxidation a water or oxygen plasma can be used, nitridation is done using water or nitrogen plasma. To achieve the deposition in the ALD mode, sample is heated up to a certain temperature, for most processes being in the range from 150 to 300 °C.


Publications:

  • Kaushik, P.; Eliáš, M.; Michalička, J.; Hegemann, D.; Pytlíček, Z.; Nečas, D.; Zajíčková, L., 2019: Atomic layer deposition of titanium dioxide on multi-walled carbon nanotubes for ammonia gas sensing. SURFACE AND COATINGS TECHNOLOGY 370, p. 235 - 243, doi: 10.1016/j.surfcoat.2019.04.031
    (ALD, EVAPORATOR, PECVD-NANOFAB, WOOLLAM-VIS, RIGAKU3, KRATOS-XPS, VERIOS, TITAN)
  • Fecko, P., 2019: Gecko mimicking surfaces. MASTER´S THESIS , p. 1 - 52
    (SUSS-RCD8, SUSS-MA8, DWL, DRIE, LYRA, ALD, RIE-FLUORINE, ICON-SPM)
  • Procházka, P., 2018: Fabrication of graphene and study of its physical properties. PH.D. THESIS , p. 1 - 139
    (ALD, DIENER, EVAPORATOR, MIRA, PECVD, TERS, WIRE-BONDER)
  • Stará, V.; Procházka, P.; Mareček, D.; Šikola, T.; Čechal, J., 2018: Ambipolar remote graphene doping by low-energy electron beam irradiation. NANOSCALE 10(37), p. 17520 - 17524, doi: 10.1039/C8NR06483K
    (ALD, DIENER, DWL, EVAPORATOR)
  • Vančík, S., 2018: MEMS microhotplate platform for chemical sensors. MASTER´S THESIS , p. 1 - 68
    (DWL, ALD, MAGNETRON, EVAPORATOR, RIE-FLUORINE, SUSS-MA8, DEKTAK, MPS150, RIE-CHLORINE)

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