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An ultra-low energy (30-200 eV) ion-atomic beam source for ion-beam-assisted deposition in ultrahigh vacuum

REVIEW OF SCIENTIFIC INSTRUMENTS

Mach, J; Samoril, T; Voborny, S; Kolibal, M; Zlamal, J; Spousta, J; Dittrichova, L; Sikola, T, 2011: An ultra-low energy (30-200 eV) ion-atomic beam source for ion-beam-assisted deposition in ultrahigh vacuum. REVIEW OF SCIENTIFIC INSTRUMENTS 82(8), doi: 10.1063/1.3622749

Research Groups:

• Fabrication and Characterisation of Nanostructures

CEITEC authors:

• Jindřich Mach, Ph.D.
• Prof. Miroslav Kolíbal, Ph.D.
• Prof. Tomáš Šikola