E-beam writer RAITH150 Two (RAITH)

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Guarantor: Zuzana Lišková, Ph.D.
Technology / Methodology: Nanolitography infrastructure
Instrument status: Non Operational Non Operational, 31.7.2025 09:44, More systematic issues, zuzka will check the system on Monday...
Equipment placement: CEITEC Nano - C1.29
Research group: CF: CEITEC Nano


Description:

Raith 150 Two is high-resolution low voltage electron beam lithography (EBL) and metrology system. It is suitable for the research and development of MEMS, micro and nanoelectronic, plasmonic, photonic systems, and integrated optical devices. It comes with sample holders capable of mounting up to 6´ substrate. The fabrication of 20 nm structures is guaranteed, while it is possible to write structures down to 10 nm in size. The system also contains FBMS (fixed beam moving stage) module for the writing of long continuous patterns without stitching errors, and the proximity effect correction SW package is available for optimized writing of near objects.
Raith 150 Two is equipped with an ultra-high-resolution Carl-Zeiss Gemini electron optics system. SEM image is recorded with help of InLens and SE detectors with the resolution of 1 – 2 nm at most acceleration voltages. The range of voltages is 0,3 – 30 kV and the user can select the apertures to control the beam current. High precision writing is possible due to the laser interferometric stage with the lateral movement resolution of 2 nm and large-scale Z travel.
This EBL system is suitable for long, time-demanding exposures also thanks to its split room setup, which ensures environmental isolation together with temperature stabilization.


Publications:

  • Martyniuk, O.; Chaudhary, V.; Rhanbouri, MA.; Laguta, O.; Tahsin, M.; Gaskill, DK.; El Fatimy,A .; Neugebauer, P., 2025: Quantum dots array: an approach to multipixel devices. JOURNAL OF PHYSICS D - APPLIED PHYSICS 58(13), doi: 10.1088/1361-6463/adacf8; FULL TEXT
    (KRATOS-XPS, EVAPORATOR, RAITH, CRYOGENIC)
  • Rejhon, M.; Dědič, V.; Shestopalov, M.; Kunc, J.; Riedo, E., 2024: Impact of metastable graphene-diamond coatings on the fracture toughness of silicon carbide. NANOSCALE 16, p. 10590 - 10596, doi: 10.1039/D3NR06281C; FULL TEXT
    (RAITH)
  • KLÍMA, J.; WOJEWODA, O.; ROUČKA, V.; MOLNÁR, T.; HOLOBRÁDEK, J.; URBÁNEK, M., 2024: Zero-field spin wave turns. APPLIED PHYSICS LETTERS 124(11), doi: 10.1063/5.0189394; FULL TEXT
    (BRILLOUIN, EVAPORATOR, LYRA, KERR-MICROSCOPE, RAITH, ICON-SPM)
  • Singh, A.; Němec, H.; Kunc, J.; Kužel, P., 2024: Nanoscale terahertz conductivity and ultrafast dynamics of terahertz plasmons in periodic arrays of epitaxial graphene nanoribbons. PHYSICAL REVIEW RESEARCH 6(3), doi: 10.1103/PhysRevResearch.6.033063; FULL TEXT
    (RAITH, RIE-FLUORINE)
  • Kunc, J.; Fridrišek, T.; Shestopalov, M.; Jo, J.; Park, K., 2024: Graphene–insulator–metal diodes: Enhanced dielectric strength of the Al2O3 barrier. AIP ADVANCES 14(9), p. 1 - 9, doi: 10.1063/5.0223763; FULL TEXT
    (RAITH, RIE-FLUORINE, ALD, EVAPORATOR, WIRE-BONDER, KRATOS-XPS)

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