E-beam writer RAITH150 Two (RAITH)

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Guarantor: Zuzana Lišková, Ph.D.
Technology / Methodology: Nanolitography infrastructure
Instrument status: Operational Operational, 15.4.2024 12:44
Equipment placement: CEITEC Nano - C1.29
Research group: CF: CEITEC Nano


Description:

Raith 150 Two is high-resolution low voltage electron beam lithography (EBL) and metrology system. It is suitable for the research and development of MEMS, micro and nanoelectronic, plasmonic, photonic systems, and integrated optical devices. It comes with sample holders capable of mounting up to 6´ substrate. The fabrication of 20 nm structures is guaranteed, while it is possible to write structures down to 10 nm in size. The system also contains FBMS (fixed beam moving stage) module for the writing of long continuous patterns without stitching errors, and the proximity effect correction SW package is available for optimized writing of near objects.
Raith 150 Two is equipped with an ultra-high-resolution Carl-Zeiss Gemini electron optics system. SEM image is recorded with help of InLens and SE detectors with the resolution of 1 – 2 nm at most acceleration voltages. The range of voltages is 0,3 – 30 kV and the user can select the apertures to control the beam current. High precision writing is possible due to the laser interferometric stage with the lateral movement resolution of 2 nm and large-scale Z travel.
This EBL system is suitable for long, time-demanding exposures also thanks to its split room setup, which ensures environmental isolation together with temperature stabilization.


Publications:

  • Kunc, J.; Morzhuk, B.; Shestopalov, M.; Fridrišek, T.; Dědič, V., 2023: Spectral current density and responsivity scaling for Fourier transform photocurrent spectroscopy. REVIEW OF SCIENTIFIC INSTRUMENTS 94(5), doi: 10.1063/5.0139027; FULL TEXT
    (RAITH, MIRA-EBL, EVAPORATOR, RIE-FLUORINE)
  • WOJEWODA, O.; LIGMAJER, F.; HRTOŇ, M.; KLÍMA, J.; DHANKHAR, M.; DAVÍDKOVÁ, K.; STAŇO, M.; HOLOBRÁDEK, J.; KRČMA, J.; ZLÁMAL, J.; ŠIKOLA, T.; URBÁNEK, M., 2023: Observing high-k magnons with Mie-resonance-enhanced Brillouin light scattering. COMMUNICATIONS PHYSICS 6(1), p. 1 - 10, doi: 10.1038/s42005-023-01214-z; FULL TEXT
    (RAITH, MIRA-EBL, EVAPORATOR, MAGNETRON, ALD, LYRA, ICON-SPM, BRILLOUIN)
  • WOJEWODA, O.; HRTOŇ, M.; DHANKHAR, M.; KRČMA, J.; DAVÍDKOVÁ, K.; KLÍMA, J.; HOLOBRÁDEK, J.; LIGMAJER, F.; ŠIKOLA, T.; URBÁNEK, M., 2023: Phase-resolved optical characterization of nanoscale spin waves. APPLIED PHYSICS LETTERS 122(20), p. 1 - 6, doi: 10.1063/5.0151338; FULL TEXT
    (RAITH, BRILLOUIN, LYRA, MAGNETRON, EVAPORATOR)
  • KNAUER, S.; DAVÍDKOVÁ, K.; SCHMOLL, D.; SERHA, R.; VORONOV, A.; WANG, Q.; VERBA, R.; DOBROVOLSKIY, O.; LINDNER, M.; REIMANN, T.; DUBS, C.; URBÁNEK, M.; CHUMAK, A., 2023: Propagating spin-wave spectroscopy in a liquid-phase epitaxial nanometer-thick YIG film at millikelvin temperatures. JOURNAL OF APPLIED PHYSICS 133(14), p. 1 - 8, doi: 10.1063/5.0137437; FULL TEXT
    (RAITH, RIE-FLUORINE, SCIA, BRILLOUIN, EVAPORATOR, VNA-MPI)
  • Schánilec, V. , 2023: Artificial arrays of magnetic nanostructures. PH.D. THESIS , p. 1 - 128; FULL TEXT
    (RAITH, EVAPORATOR)

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