GenIsys Lithography workshop for CEITEC Nano Users
Dear CEITEC Nano users,
In the 25th – 26th of June will be held GenIsys workshop in Ceitec Nano. First day will be dedicated to short introduction / basic work with Beamer/Tracer. Second day will be dedicated to more advanced work with Beamer/Lab. Workshop will be held in the PC room at building C. There will be a license on every computer so participants will be able to control the software during function explanation.
|Tuesday 25th June||13:30 – 17:00||- Basic work with Beamer, Tracer and Lab|
|Wednesday 26th June||9:00 – 15:00||- Advanced work with Beamer and Lab|
Beamer = Software for data preparation for Electron beam and Laser beam lithography
Tracer = Quantification of electron scattering and process effects
Lab = Layout and process optimization for lithography technologies
Please let us know who is going to attend the workshop (day1, 2 or both) by filling registration.
This workshop is highly recommended to everyone who wants to have his/her lithography best as it could be.
Just a reminder – you can have a training for Beamer/Tracer/Lab after consultation with Robert Dóczy, so you can use it regularly.