GenIsys Lithography workshop for CEITEC Nano Users

25. 6. - 26. 6. 2019, 13:30 - 15:00
CEITEC BUT, Brno, Purkyňova 123, Building C, PC Room

Dear CEITEC Nano users,

In the 25th – 26th of June will be held GenIsys workshop in Ceitec Nano. First day will be dedicated to short introduction / basic work with Beamer/Tracer. Second day will be dedicated to more advanced work with Beamer/Lab. Workshop will be held in the PC room at building C. There will be a license on every computer so participants will be able to control the software during function explanation.


Preliminary agenda:

Tuesday 25th June 13:30 – 17:00 - Basic work with Beamer, Tracer and Lab
Wednesday 26th June 9:00 – 15:00 - Advanced work with Beamer and Lab


Beamer = Software for data preparation for Electron beam and Laser beam lithography
Tracer = Quantification of electron scattering and process effects
Lab = Layout and process optimization for lithography technologies


Please let us know who is going to attend the workshop (day1, 2 or both) by filling registration.

This workshop is highly recommended to everyone who wants to have his/her lithography best as it could be.

Just a reminder – you can have a training for Beamer/Tracer/Lab after consultation with Robert Dóczy, so you can use it regularly.

GenIsys workshop in Ceitec Nano