High temperature plasma enhanced chemical vapour deposition system on C-based materials Oxford Instruments Plasma Technology NanoFab (PECVD-NANOFAB)

High temperature plasma enhanced chemical vapour deposition system on C-based materials Oxford Instruments Plasma Technology NanoFab
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Guarantor: Marek Eliáš, Ph.D.
Technology / Methodology: Etching & Deposition
Instrument status: Operational Operational, 27.4.2020 10:20
Equipment placement: CEITEC Nano - C1.34
Research group: CF: CEITEC Nano


Detailed description:

Chemical vapour deposition system going to very high deposition temperatures dedicated to the deposition of carbon nanomaterials, possibilities of plasma enhancement by discharges of different frequency (including their regular switching).


Publications:

  • Kaushik, P.; Eliáš, M.; Michalička, J.; Hegemann, D.; Pytlíček, Z.; Nečas, D.; Zajíčková, L., 2019: Atomic layer deposition of titanium dioxide on multi-walled carbon nanotubes for ammonia gas sensing. SURFACE AND COATINGS TECHNOLOGY 370, p. 235 - 243, doi: 10.1016/j.surfcoat.2019.04.031
    (ALD, EVAPORATOR, PECVD-NANOFAB, WOOLLAM-VIS, RIGAKU3, KRATOS-XPS, VERIOS, TITAN)
  • Mouralova, K.; Zahradnicek, R.; Bednar, J., 2019: Study of vertical graphene growth on silver substrate based on design of experiment. DIAMOND AND RELATED MATERIALS 97, p. 107439-1 - 107439-7, doi: 10.1016/j.diamond.2019.107439
    (EVAPORATOR, PECVD-NANOFAB, VERIOS, TERS, HELIOS, ICON-SPM, TITAN)