Magnetron sputtering system BESTEC (MAGNETRON)

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Guarantor: Jan Prášek, Ph.D.
Technology / Methodology: Etching & Deposition
Instrument status: Operational Operational, 2.6.2020 13:52
Equipment placement: CEITEC Nano - C1.36
Research group: CF: CEITEC Nano


Detailed description:

The system consists of a sputter deposition chamber with 8 magnetrons in sputter up configuration. The lid flange of the sputtering chamber is sealed with double viton o- rings and differentially pumped.
For the chamber we use turbomolecular pumps with scroll foreline pump. For good end pressure a Ti- sublimation pump is also included. With the pumping configuration it is possible to reach the base pressure of 3x 10-9 mbar with bake out of the clean chamber. The gas inlet in the process chambers is realized with mass flow controllers. For sputter gas Ar we use a 50sccm range device and for O2 and N2 a 10sccm device is used. Pressure regulation is done by up stream process using a three stage valve over the turbo pump. The substrates max. 4” in diameter or several smaller substráte pieces can be mounted on different sample holders from molybdenum (totally 2 in the scope of supply).
There is a manually sample transfer foreseen into and out of the process chamber.
In the process chamber the sample can be heated to 850°C with radiation heating. The sample stage is thermal shielded and water cooled to prevent from heating up. The substrate can rotate motorized with max. 30 rpm.


Publications:

  • Uhlíř, V.; Pressacco, F.; Arregi, J. A.; Procházka, P.; Průša, S.; Potoček, M.; Šikola, T.; Čechal, J.; Bendounan, A.; Sirotti, F., 2020: Single-layer graphene on epitaxial FeRh thin films. APPLIED SURFACE SCIENCE 514, p. 145923-1 - 145923-7, doi: 10.1016/j.apsusc.2020.145923
    (MAGNETRON, VERSALAB, RIGAKU9, UHV-LEEM, UHV-LEIS, UHV-SPM, UHV-PREPARATION, UHV-XPS, SIMS)
  • Arregi, J. A.; Caha, O.; Uhlíř, V., 2020: Evolution of strain across the magnetostructural phase transition in epitaxial FeRh films on different substrates. PHYSICAL REVIEW B 101(17), p. 174413-1 - 174413-14, doi: 10.1103/PhysRevB.101.174413
    (MAGNETRON, VERSALAB, RIGAKU9)
  • Lednický, T.; Bonyár, A., 2020: Large Scale Fabrication of Ordered Gold Nanoparticle-Epoxy Surface Nanocomposites and Their Application as Label-Free Plasmonic DNA Biosensors. ACS APPLIED MATERIALS AND INTERFACES 12(4), p. 4804 - 4814, doi: 10.1021/acsami.9b20907
    (MAGNETRON, RIE-FLUORINE, VERIOS, LYRA, HELIOS, KRATOS-XPS)
  • Horak, M; Krapek, V; Hrton, M; Konecna, A; Ligmajer, F; Stoger-Pollach, M; Samoril, T; Patak, A; Edes, Z; Metelka, O; Babocky, J; Sikola, T, 2019: Limits of Babinet´s principle for solid and hollow plasmonic antennas. SCIENTIFIC REPORTS 9, p. 4004-1 - 4004-11, doi: 10.1038/s41598-019-40500-1
    (FTIR, HELIOS, LYRA, MAGNETRON, SNOM-NANONICS, TITAN)
  • Michlíček, M.; Manakhov, A.; Dvořáková, E.; Zajíčková, L., 2019: Homogeneity and penetration depth of atmospheric pressure plasma polymerization onto electrospun nanofibrous mats. APPLIED SURFACE SCIENCE 471, p. 835 - 841, doi: 10.1016/j.apsusc.2018.11.148
    (LYRA, MAGNETRON, FTIR, KRATOS-XPS)

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