Mechanical profilometer Bruker Dektak XT (DEKTAK)

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Guarantor: Vojtěch Švarc, Ph.D.
Technology / Methodology: Nanolitography infrastructure
Instrument status: Operational Operational, 27.8.2026 18:20
Equipment placement: CEITEC Nano - C1.30
Research group: CF: CEITEC Nano


Description:

The DektakXT® stylus surface profiler is an advanced thin and thick film step height measurement tool. In addition to profiling surface topography and waviness, the DektakXT system measures roughness in the nanometer range. Available with a standard manual sample-positioning stage or an optional automatic X-Y or theta stage, it provides step-height repeatability of 5Å (<0.6 nm).
In addition to taking two-dimensional surface profile measurements, the DektakXT system can produce three-dimensional measurements and analyses when equipped with the 3D Mapping Option. With the N-Lite+ Option, it can allow low-force stylus engagement and scanning, optimized to protect force-sensitive samples.


Publications:

  • RONOH, K.; NOVOTNÝ, J.; MRŇA, L.; KNÁPEK, A.; SULAK, I.; SOBOLA, D., 2026: Ultrafast laser-induced surface modification of Kanthal® AF: Morphology, chemistry, and wettability under ambient conditions. MATERIALS CHARACTERIZATION 234, doi: 10.1016/j.matchar.2026.116196; FULL TEXT
    (VERIOS, DEKTAK, MIRA-STAN, KRATOS-XPS, WITEC-RAMAN, SEE-SYSTEM)
  • Děcký, M., 2025: . MASTER'S THESIS , p. 1 - 63; FULL TEXT
    (MIRA-EBL, SUSS-MA8, DEKTAK, NANOCALC, MAGNETRON, RIE-FLUORINE, EVAPORATOR, WIRE-BONDER, MPS150, LYRA, LASER-DICER)
  • Kipkurui Ronoh; Ivo Šulák; Dinara Sobola, 2025: Effect of ultrafast laser ablation on the wettability of superalloys. PROCEDIA STRUCTURAL INTEGRITY 74, p. 77 - 84, doi: 10.1016/j.prostr.2025.10.037; FULL TEXT
    (VERIOS, MIRA-STAN, DEKTAK, SEE-SYSTEM, KRATOS-XPS)
  • Horký, M., 2025: . PH.D. THESIS , p. 1 - 181; FULL TEXT
    (RAITH, MIRA-EBL, LYRA, TEGRAMIN, SUSS-MA8, DEKTAK, NANOCALC, MAGNETRON, EVAPORATOR, RIE-FLUORINE, WIRE-BONDER, MPS150, CRYOGENIC, LAKESHORE, VERSALAB, ICON-SPM, UHV-PREPARATION, TITAN, HELIOS, VERIOS, RIGAKU3, RIGAKU9)
  • JANŮŠOVÁ, M.; NEČAS, D.; NAVASCUES, P.; HEGEMANN, D.; GAVRANOVIĆ, S.; ZAJÍČKOVÁ, L., 2025: Insight into plasma polymerization with a significant contribution of etching to the deposition process. SURFACE & COATINGS TECHNOLOGY 503, doi: 10.1016/j.surfcoat.2025.131962; FULL TEXT
    (DEKTAK, WOOLLAM-VIS, KRATOS-XPS)

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