nanoScanning Auger Microscopy/ Scanning electron microscopy with polarization analysis Scienta Omicron nanoSAM Lab (NANOSAM)

CONTACT US

Guarantor: Petr Bábor, Ph.D.
Technology / Methodology: Probe microscopy & Nanomanipulation
Instrument status: Operational Operational, 29.4.2020 15:07, Prep. chamber - ion gauge fil #2 only
Equipment placement: CEITEC Nano - C1.38a
Research group: CF: CEITEC Nano


Detailed description:

The NanoSAM LAB S is a dedicated surface analysis UHV system for high resolution structural and chemical analysis by Scanning Auger Microscopy (SAM), Scanning Electron Microscopy (SEM) and Secondary Electron Microscopy with Polarization Analysis (SEMPA) for the characterization of the magnetic domain structure. The instrument is designed for use together with the UHV Gemini high resolution electron column. It includes Matrix software and electronics for static Auger spectroscopy (AES) and Scanning Auger Microscopy (SAM). In combination with the UHV Gemini, Matrix provides an unsurpassed drift correction technology based on auto-correlation of subsequent SEM images. This opens up the possibility to perform long term AES measurements on very small features with low intensity, or elemental-resolved SAM maps of nanostructures with a low concentration of elements of interest and / or low sensitivity factors. The NanoSAM LAB is equipped with high precision goniometer-mounted four axis UHV stage for the combination of high resolution SEM, SAM and SEMPA, which allows heating up to 750 K. Moreover, the NanoSAM LAB embodies preparation chamber which comprises a manipulator with the possibility of heating the sample to 1500 °C by resistive heating and 900 ° C by radiative heating. The preparation chamber contains 8 flanges for user extensions.


Publications:

  • Kolibal, M; Pejchal, T; Musalek, T; Sikola, T, 2018: Catalyst-substrate interaction and growth delay in vapor-liquid-solid nanowire growth. NANOTECHNOLOGY 29(20), p. 205603-1 - 205603-7, doi: 10.1088/1361-6528/aab474
    (NANOSAM, VERIOS)
  • Jiang, LL; Xiao, N; Wang, BR; Grustan-Gutierrez, E; Jing, X; Babor, P; Kolibal, M; Lu, GY; Wu, TR; Wang, HM; Hui, F; Shi, YY; Song, B; Xie, XM; Lanza, M, 2017: High-resolution characterization of hexagonal boron nitride coatings exposed to aqueous and air oxidative environments. NANO RESEARCH 10(6), p. 2046 - 2055, doi: 10.1007/s12274-016-1393-2
    (NANOSAM, SIMS)
  • Elbadawi, C; Tran, TT; Kolibal, M; Sikola, T; Scott, J; Cai, QR; Li, LH; Taniguchi, T; Watanabe, K; Toth, M; Aharonovich, I; Lobo, C, 2016: Electron beam directed etching of hexagonal boron nitride. NANOSCALE 8(36), p. 16182 - 16186, doi: 10.1039/c6nr04959a
    (NANOSAM)
  • Kolibal, M; Pejchal, T; Vystavel, T; Sikola, T, 2016: The Synergic Effect of Atomic Hydrogen Adsorption and Catalyst Spreading on Ge Nanowire Growth Orientation and Kinking. NANO LETTERS 16(8), p. 4880 - 4886, doi: 10.1021/acs.nanolett.6b01352
    (NANOSAM, TITAN)