Resist stripper Diener electronic NANO Plasma cleaner (DIENER)

Resist stripper Diener electronic NANO Plasma cleaner
CONTACT US

Guarantor: Marek Eliáš, Ph.D.
Technology / Methodology: Etching & Deposition
Instrument status: Operational Operational, 9.2.2018 16:38
Equipment placement: CEITEC Nano - C1.30
Research group: CF: CEITEC Nano


Detailed description:

Diener NANO Plasma Cleaner with microwave generator can be used for stripping of the resist. Microwave plasma is ideal for most resist removal in modern device fabrication because it produces a very high concentration of chemically active species along with low energy ion bombardment. Therefore, it guarantees fast ash rate and a damage-free plasma cleaning. Microwave plasma systems are suitable for various substrate technologies like Si, III/V-compounds, quartz, ceramic, lithium niobate, copper interconnect devices etc. Oxygen plasma generates oxygen radicals and O2 ions. It is well suited for the removing of photoresist because oxygen radicals fast etch polymers and organics under formation of CO2 and water (ashing). The samples (max. size 8‘‘) can be heated (up to 100 C) by the chuck in order to ease the stripping of the photoresist.
In biomedical applications, plasma cleaning is useful for achieving compatibility between synthetic biomaterials and natural tissues. Surface modification minimizes adverse reactions such as inflammation, infection, and thrombosis formation.


Publications:

  • Chmela, O., 2020: Progress toward the development of single nanowire-based arrays for gas sensing applications. PH.D THESIS , p. 1 - 199
    (ALD, DWL, KAUFMAN, DIENER, SUSS-MA8, SUSS-RCD8, RAITH, MAGNETRON, EVAPORATOR, RIE-FLUORINE, SCIA, DEKTAK, ICON-SPM, NANOCALC, MPS150, WIRE-BONDER)
  • Bartošík, M.; Mach, J.; Piastek, J.; Nezval, D.; Konečný, M.; Švarc, V.; Ensslin, K.; Šikola, T., 2020: Mechanism and Suppression of Physisorbed-Water-Caused Hysteresis in Graphene FET Sensors. ACS SENSORS 5(9), p. 2940 - 2949, doi: 10.1021/acssensors.0c01441
    (EVAPORATOR, DWL, DIENER)
  • Brodský, J., 2019: Characterization of graphene elecrical properties on MEMS structures. BACHELOR´S THESIS , p. 1 - 50
    (MPS150, WITEC-RAMAN, EVAPORATOR, DRIE, PECVD, DWL, SUSS-MA8, RIE-FLUORINE, RIE-CHLORINE, DIENER, SCIA)
  • GABLECH, I.; KLEMPA, J.; PEKÁREK, J.; VYROUBAL, P.; KUNZ, J.; NEUŽIL, P, 2019: Aluminum nitride based piezoelectric harvesters. 2019 19TH INTERNATIONAL CONFERENCE ON MICRO AND NANOTECHNOLOGY FOR POWER GENERATION AND ENERGY CONVERSION APPLICATIONS (POWERMEMS) (001), p. 1 - 4, doi: 10.1109/PowerMEMS49317.2019.82063211368; FULL TEXT
    (DIENER, DRIE, DWL, KAUFMAN, RIE-CHLORINE, SUSS-MA8)
  • Procházka, P., 2018: Fabrication of graphene and study of its physical properties. PH.D. THESIS , p. 1 - 139
    (ALD, DIENER, EVAPORATOR, MIRA, PECVD, TERS, WIRE-BONDER)

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