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The transport and surface reactivity of O atoms during the atmospheric plasma etching of hydrogenated amorphous carbon films

PLASMA SOURCES SCIENCE & TECHNOLOGY

Hefny, MM; Necas, D; Zajickova, L; Benedikt, J, 2019: The transport and surface reactivity of O atoms during the atmospheric plasma etching of hydrogenated amorphous carbon films. PLASMA SOURCES SCIENCE & TECHNOLOGY 28(3), doi: 10.1088/1361-6595/ab0354

Research Groups:

• Plasma Technologies

CEITEC authors:

• David Nečas, Ph.D.
• Lenka Zajíčková, Ph.D.