Ultra High Vacuum Preparation and Analytical System - Custom Deposition Chamber SPECS (UHV-DEPOSITION)

CONTACT US

Guarantor: Marek Otevřel, Ph.D.
Instrument status: Operational Operational, 6.8.2018 13:27
Equipment placement: CEITEC Nano - C1.38
Research group: CF: CEITEC Nano


Detailed description:

Ultra High Vacuum Preparation and Analytical System - Custom Deposition Chamber SPECS


Publications:

  • Kormoš, L.; Procházka, P.; Makoveev, A. O.; Čechal, J., 2020: Complex k-uniform tilings by a simple bitopic precursor self-assembled on Ag(001) surface. NATURE COMMUNICATIONS 11(1), p. 1856-1 - 1856-6, doi: 10.1038/s41467-020-15727-
    (UHV-DEPOSITION, UHV-PREPARATION, UHV-LEEM, UHV-SPM, UHV-XPS)
  • Procházka, P.; Gosalvez, M. A.; Kormoš, L.; de la Torre, B.; Gallardo, A.; Alberdi-Rodriguez, J.; Chutora, T.; Makoveev, A. O.; Shahsavar, A.; Arnau, A.; Jelínek, P.; Čechal, J., 2020: Multiscale Analysis of Phase Transformations in Self-Assembled Layers of 4,4′-Biphenyl Dicarboxylic Acid on the Ag(001) Surface. ACS NANO 14(6), p. 7269 - 7279, doi: 10.1021/acsnano.0c02491
    (UHV-LEEM, UHV-SPM, UHV-XPS, UHV-PREPARATION, UHV-DEPOSITION)
  • Fikáček, J.; Procházka, P.; Stetsovych, V.; Průša, S.; Vondráček, M.; Kormoš, L.; Skála, T.; Vlaic, P.; Caha, O.; Carva, K.; Čechal, J.; Springholz, G.; Honolka, J., 2020: Step-edge assisted large scale FeSe monolayer growth on epitaxial Bi_2 Se_3 thin films. NEW JOURNAL OF PHYSICS 22(7), p. 073050-1 - 073050-12, doi: 10.1088/1367-2630/ab9b59
    (UHV-LEEM, UHV-XPS, UHV-LEIS, UHV-DEPOSITION, UHV-PREPARATION)
  • Suchánková, K., 2019: Molecular beam deposition of thin films of organic semiconductors and the structure of the film. MASTER´S THESIS , p. 1 - 64
    (UHV-PREPARATION, UHV-DEPOSITION, RIGAKU9)
  • Gloss, J; Horky, M; Krizakova, V; Flajsman, L; Schmid, M; Urbanek, M; Varga, P, 2019: The growth of metastable fcc Fe78Ni22 thin films on H-Si(100) substrates suitable for focused ion beam direct magnetic patterning. APPLIED SURFACE SCIENCE 469, p. 747 - 752, doi: 10.1016/j.apsusc.2018.10.263
    (ICON-SPM, KERR-MICROSCOPE, LYRA, UHV-DEPOSITION, UHV-PREPARATION, UHV-XPS)

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