UHV Preparation and Analytical System - Custom Deposition Chamber SPECS (UHV-DEPOSITION)

Description:

The UHV-DEPOSITION - a multi-purpose chamber for the preparation of surfaces and thin layers (UHV-Deposition) is one of the instruments of the UHV-Cluster, which combines preparation and in-situ analysis by several complementary methods for the characterization of surfaces and thin films. It provides:
- the possibility of preparation of samples and of deposition of materials by thermal evaporation (e.g. metals, organics).
- calibration of deposition rates by a quartz microbalance.
- the possibility to mount custom components like effusion cells.
The chamber is equipped with an RF plasma source for atomic nitrogen and oxygen.
Equipment: sample heating by electron beam heater up to 1400 °C, sample cooling by L-N2, pyrometer for temperature measurement.

Publications:

• Mirdamadi, H.; Wang, R.; David, J.; Jiang, T.; Wang, Y.; Vařeka, K.; Dymáček, M.; Bábor, P.; Šikola, T.; Kolíbal, M., 2026: . ACS NANO 20(10), p. 8255 - 8265, doi: 10.1021/acsnano.5c12130; FULL TEXT
  (UHV-DEPOSITION, UHV-LEEM, UHV-XPS, SIMS)
• JAKUB, Z.; PLANER, J.; HRŮZA, D.; ENDSTRASSER, Z.; PROCHÁZKA, P.; ČECHAL, J., 2025: Atomically-defined on-surface synthesis of multilayer metal-organic frameworks. COMMUNICATIONS CHEMISTRY 8(1), doi: 10.1038/s42004-025-01742-5; FULL TEXT
  (UHV-DEPOSITION, UHV-XPS, UHV-SPM, UHV-PREPARATION)
• Prochazka, P.; Frezza, F.; Sánchez-Grande, A.; Carrera, M.; Chen, QF.; Stará, V.; Kurowská, A.; Curiel, D.; Jelínek, P.; Cechal, J., 2025: Monitoring On-Surface Chemical Reactions by Low-Energy Electron Microscopy: from Conformation Change to Ring Closure in 2D Molecular Gas. CHEMISTRY 31(20), p. e20250056 - 6, doi: 10.1002/chem.202500561; FULL TEXT
  (UHV-LEEM, UHV-SPM, UHV-DEPOSITION, UHV-PREPARATION)
• JAKUB, Z.; PLANER, J.; HRŮZA, D.; TRLLOVÁ SHAHSAVAR, A.; PAVELEC, J.; ČECHAL, J., 2025: Identical Fe-N₄ Sites with Different Reactivity: Elucidating the Effect of Support Curvature. ACS APPLIED MATERIALS & INTERFACES 17(6), p. 10136 - 10144, doi: 10.1021/acsami.4c19913; FULL TEXT
  (UHV-CLUSTER, UHV-DEPOSITION, UHV-PREPARATION, UHV-SPM, UHV-XPS)
• KRAJŇÁK, T.; STARÁ, V.; PROCHÁZKA, P.; PLANER, J.; SKÁLA, T.; BLATNIK, M.; ČECHAL, J., 2024: . ACS APPLIED MATERIALS & INTERFACES 16(14), p. 18099 - 13, doi: 10.1021/acsami.3c18697; FULL TEXT
  (UHV-LEEM, UHV-XPS, UHV-PREPARATION, UHV-SPM, UHV-DEPOSITION)

• JAKUB, Z.; TRLLOVÁ SHAHSAVAR, A.; PLANER, J.; HRŮZA, D.; HERICH, O.; PROCHÁZKA, P.; ČECHAL, J., 2024: . JOURNAL OF THE AMERICAN CHEMICAL SOCIETY 146(5), p. 3471 - 12, doi: 10.1021/jacs.3c13212; FULL TEXT
  (UHV-DEPOSITION, UHV-LEEM, UHV-XPS, UHV-PREPARATION, UHV-SPM)
• PROCHÁZKA, P.; ČECHAL, J., 2023: . ULTRAMICROSCOPY 253, doi: 10.1016/j.ultramic.2023.113799; FULL TEXT
  (UHV-DEPOSITION, UHV-LEEM, UHV-PREPARATION, UHV-SPM)
• Makoveev, A. O., 2023: . PH.D. THESIS , p. 1 - 169; FULL TEXT
  (UHV-DEPOSITION, UHV-LEEM, UHV-XPS, UHV-PREPARATION, UHV-SPM)
• Jeřábek, F., 2023: . BACHELOR'S THESIS , p. 1 - 42; FULL TEXT
  (UHV-DEPOSITION, UHV-PREPARATION, UHV-LEEM, UHV-SPM)
• David, J., 2023: . MASTER'S THESIS , p. 1 - 69; FULL TEXT
  (UHV-DEPOSITION, UHV-PREPARATION, UHV-LEEM, UHV-XPS, UHV-SPM)
• KACHTÍK, L.; CITTERBERG, D.; BUKVIŠOVÁ, K.; KEJÍK, L.; LIGMAJER, F.; KOVAŘÍK, M.; MUSÁLEK, T.; KRISHNAPPA, M.; ŠIKOLA, T.; KOLÍBAL, M., 2023: . NANO LETTERS 23(13), p. 6010 - 8, doi: 10.1021/acs.nanolett.3c01213; FULL TEXT
  (UHV-XPS, UHV-DEPOSITION, KRATOS-XPS)
• MAKOVEEV, A.; PROCHÁZKA, P.; SHAHSAVAR, A.; KORMOŠ, L.; KRAJŇÁK, T.; STARÁ, V.; ČECHAL, J., 2022: . APPLIED SURFACE SCIENCE 600, p. 154106 - 7, doi: 10.1016/j.apsusc.2022.154106; FULL TEXT
  (UHV-DEPOSITION, UHV-LEEM, UHV-XPS, UHV-PREPARATION, UHV-SPM)
• STARÁ, V.; PROCHÁZKA, P.; PLANER, J.; SHAHSAVAR, A.; MAKOVEEV, A.; SKÁLA, T.; BLATNIK, M.; ČECHAL, J., 2022: . PHYSICAL REVIEW APPLIED 18(4), doi: 10.1103/PhysRevApplied.18.044048; FULL TEXT
  (UHV-DEPOSITION, UHV-PREPARATION, UHV-LEEM, UHV-SPM, UHV-XPS)
• JAKUB, Z.; KUROWSKÁ, A.; HERICH, O.; ČERNÁ, L.; KORMOŠ, L.; SHAHSAVAR, A.; PROCHÁZKA, P.; ČECHAL, J., 2022: . NANOSCALE 14(26), p. 9507 - 9, doi: 10.1039/d2nr02017c; FULL TEXT
  (UHV-DEPOSITION, UHV-LEEM, UHV-XPS, UHV-PREPARATION, UHV-SPM)
• MAKOVEEV, A.; PROCHÁZKA, P.; BLATNIK, M.; KORMOŠ, L.; SKÁLA, T.; ČECHAL, J., 2022: . JOURNAL OF PHYSICAL CHEMISTRY C (WEB) 126(23), p. 9989 - 9, doi: 10.1021/acs.jpcc.2c02538; FULL TEXT
  (UHV-PREPARATION, UHV-DEPOSITION, UHV-LEEM, UHV-SPM, UHV-XPS)
• PEJCHAL, T.; BUKVIŠOVÁ, K.; VALLEJOS VARGAS, S.; CITTERBERG, D.; ŠIKOLA, T.; KOLÍBAL, M., 2022: . APPLIED SURFACE SCIENCE 583, p. 152475 - 6, doi: 10.1016/j.apsusc.2022.152475; FULL TEXT
  (WITEC-RAMAN, UHV-DEPOSITION, UHV-PREPARATION, NANOSAM, VERIOS, HELIOS, KRATOS-XPS)
• Pejchal, T., 2021: . PH.D. THESIS ; FULL TEXT
  (NANOSAM, WITEC-RAMAN, UHV-DEPOSITION, UHV-PREPARATION, VERIOS, HELIOS, TITAN, ALD-FIJI, EVAPORATOR, MIRA-EBL, MPS150, KRATOS-XPS)
• Kormoš, L., 2021: . PH.D. THESIS , p. 1 - 140; FULL TEXT
  (UHV-DEPOSITION, UHV-PREPARATION, UHV-XPS, UHV-LEEM, UHV-SPM, EVAPORATOR)
• Zadorozhnii, O., 2021: . MASTER'S THESIS , p. 1 - 81; FULL TEXT
  (MAGNETRON, VERSALAB, KERR-MICROSCOPE, RAITH, RIE-FLUORINE, UHV-DEPOSITION, UHV-PREPARATION, UHV-XPS, LYRA)
• NAZZARI, D., GENZER, J., RITTER, V., BETHGE, O., BERTAGNOLLI, E., RAMER, G., LENDL, B., WATANABE, K., TANIGUCHI, T., RURALI, R., KOLÍBAL, M., LUGSTEIN, A., 2021: . JOURNAL OF PHYSICAL CHEMISTRY C (WEB) 125(18), p. 9973 - 8, doi: 10.1021/acs.jpcc.0c11033; FULL TEXT
  (UHV-LEEM, UHV-MBE, UHV-DEPOSITION)
• PROCHÁZKA, P.; KORMOŠ, L.; SHAHSAVAR, A.; STARÁ, V.; MAKOVEEV, A.; SKÁLA, T.; BLATNIK, M.; ČECHAL, J., 2021: . APPLIED SURFACE SCIENCE 547, p. 149115- - 7, doi: 10.1016/j.apsusc.2021.149115; FULL TEXT
  (UHV-DEPOSITION, UHV-PREPARATION, UHV-SPM, UHV-XPS, UHV-LEEM)
• FIKÁČEK, J.; PROCHÁZKA, P.; STETSOVYCH, V.; PRŮŠA, S.; VONDRÁČEK, M.; KORMOŠ, L.; SKÁLA, T.; VLAIC, P.; CAHA, O.; CARVA, K.; ČECHAL, J.; SPRINGHOLZ, G.; HONOLKA, J., 2020: . NEW JOURNAL OF PHYSICS 22(7), p. 1 - 12, doi: 10.1088/1367-2630/ab9b59; FULL TEXT
  (UHV-LEEM, UHV-XPS, UHV-LEIS, UHV-DEPOSITION, UHV-PREPARATION)
• PROCHÁZKA, P.; GOSALVEZ, M.; KORMOŠ, L.; DE LA TORRE, B.; GALLARDO, A.; ALBERDI-RODRIGUEZ, J.; CHUTORA, T.; MAKOVEEV, A.; SHAHSAVAR, A.; ARNAU, A.; JELÍNEK, P.; ČECHAL, J., 2020: . ACS NANO 14(6), p. 7269 - 11, doi: 10.1021/acsnano.0c02491; FULL TEXT
  (UHV-LEEM, UHV-SPM, UHV-XPS, UHV-PREPARATION, UHV-DEPOSITION)
• KORMOŠ, L.; PROCHÁZKA, P.; MAKOVEEV, A.; ČECHAL, J., 2020: . NATURE COMMUNICATIONS 11(1), p. 1 - 6, doi: 10.1038/s41467-020-15727-6; FULL TEXT
  (UHV-DEPOSITION, UHV-PREPARATION, UHV-LEEM, UHV-SPM, UHV-XPS)
• GLOSS, J.; HORKÝ, M.; KŘIŽÁKOVÁ, V.; FLAJŠMAN, L.; SCHMID, M.; URBÁNEK, M.; VARGA, P., 2019: . APPLIED SURFACE SCIENCE 469, p. 747 - 6, doi: 10.1016/j.apsusc.2018.10.263; FULL TEXT
  (KERR-MICROSCOPE, UHV-DEPOSITION, UHV-PREPARATION, UHV-XPS, LYRA, ICON-SPM)
• Suchánková, K., 2019: . MASTER'S THESIS , p. 1 - 64
  (UHV-PREPARATION, UHV-DEPOSITION, RIGAKU9)
• URBÁNEK, M.; FLAJŠMAN, L.; KŘIŽÁKOVÁ, V.; GLOSS, J.; HORKÝ, M.; SCHMID, M.; VARGA, P., 2018: . APL MATERIALS 6(6), p. 060701-1 - 7, doi: 10.1063/1.5029367; FULL TEXT
  (HELIOS, UHV-XPS, UHV-PREPARATION, UHV-DEPOSITION, RIGAKU9, KERR-MICROSCOPE, LYRA, ICON-SPM)

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