Ultra High Vacuum Preparation and Analytical system - Photoelectron Spectroscopy SPECS Phoibos 150 (UHV-XPS)

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Guarantor: Marek Otevřel, Ph.D.
Instrument status: Operational Operational, 23.4.2020 10:20
Equipment placement: CEITEC Nano - C1.38
Research group: CF: CEITEC Nano


Detailed description:

The instrument is equipped with the Al Kα and Mg Kα X-ray sources which provide photons with 1486.6eV and 1254.6eV energy respectively and He I/II UV source providing photons with energies of 21.22eV and 40.81eV respectively. The photoelectrons are analyzed in a hemispherical detector in which lens voltages direct the electron onto a two-dimensional (energy, momentum) multi-channel plate allowing for angular-resolved photoelectron spectroscopy (ARPES) experiments.
For sample handling there is a 4-axis manipulator (X, Y, Z, Polar rotation). The manipulator allows controlled sample (electron beam) heating up to 800°C (peak short flashes up to 1200°C) as well as liquid nitrogen cooling. The system allows for neutralization of non-conductive samples by means of an electron flood gun. The standard sample holder is compatible with samples of 10mm diameter. There is no general restriction for the sample material (except for Zn) however, compatibility of volatile and/or organic materials should be discussed and agreed in advance.


Publications:

  • Kormoš, L.; Procházka, P.; Makoveev, A. O.; Čechal, J., 2020: Complex k-uniform tilings by a simple bitopic precursor self-assembled on Ag(001) surface. NATURE COMMUNICATIONS 11(1), p. 1856-1 - 1856-6, doi: 10.1038/s41467-020-15727-
    (UHV-DEPOSITION, UHV-PREPARATION, UHV-LEEM, UHV-SPM, UHV-XPS)
  • Uhlíř, V.; Pressacco, F.; Arregi, J. A.; Procházka, P.; Průša, S.; Potoček, M.; Šikola, T.; Čechal, J.; Bendounan, A.; Sirotti, F., 2020: Single-layer graphene on epitaxial FeRh thin films. APPLIED SURFACE SCIENCE 514, p. 145923-1 - 145923-7, doi: 10.1016/j.apsusc.2020.145923
    (MAGNETRON, VERSALAB, RIGAKU9, UHV-LEEM, UHV-LEIS, UHV-SPM, UHV-PREPARATION, UHV-XPS, SIMS)
  • Procházka, P.; Gosalvez, M. A.; Kormoš, L.; de la Torre, B.; Gallardo, A.; Alberdi-Rodriguez, J.; Chutora, T.; Makoveev, A. O.; Shahsavar, A.; Arnau, A.; Jelínek, P.; Čechal, J., 2020: Multiscale Analysis of Phase Transformations in Self-Assembled Layers of 4,4′-Biphenyl Dicarboxylic Acid on the Ag(001) Surface. ACS NANO 14(6), p. 7269 - 7279, doi: 10.1021/acsnano.0c02491
    (UHV-LEEM, UHV-SPM, UHV-XPS, UHV-PREPARATION, UHV-DEPOSITION)
  • Fikáček, J.; Procházka, P.; Stetsovych, V.; Průša, S.; Vondráček, M.; Kormoš, L.; Skála, T.; Vlaic, P.; Caha, O.; Carva, K.; Čechal, J.; Springholz, G.; Honolka, J., 2020: Step-edge assisted large scale FeSe monolayer growth on epitaxial Bi_2 Se_3 thin films. NEW JOURNAL OF PHYSICS 22(7), p. 073050-1 - 073050-12, doi: 10.1088/1367-2630/ab9b59
    (UHV-LEEM, UHV-XPS, UHV-LEIS, UHV-DEPOSITION, UHV-PREPARATION)
  • Gloss, J; Horky, M; Krizakova, V; Flajsman, L; Schmid, M; Urbanek, M; Varga, P, 2019: The growth of metastable fcc Fe78Ni22 thin films on H-Si(100) substrates suitable for focused ion beam direct magnetic patterning. APPLIED SURFACE SCIENCE 469, p. 747 - 752, doi: 10.1016/j.apsusc.2018.10.263
    (ICON-SPM, KERR-MICROSCOPE, LYRA, UHV-DEPOSITION, UHV-PREPARATION, UHV-XPS)

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