Ultra High Vacuum Preparation and Analytical system - Photoelectron Spectroscopy SPECS Phoibos 150 (UHV-XPS)

Description:

The chamber for photoelectron spectroscopy analysis (UHV-XPS) is one of the instruments of the UHV-Cluster, which combines preparation and in-situ analysis by several complementary methods for the characterization of surfaces and thin films.
The instrument is equipped with the Al Kα and Mg Kα X-ray sources which provide photons with 1486.6eV and 1254.6eV energy respectively and He I/II UV source providing photons with energies of 21.22eV and 40.81eV respectively. The photoelectrons are analyzed in a hemispherical detector in which lens voltages direct the electron onto a two-dimensional (energy, momentum) multi-channel plate allowing for angular-resolved photoelectron spectroscopy (ARPES) experiments.

Publications:

• Jakub, Z.; Shahsavar, A.; Planer, J.; Hrůza, D.; Herich, O.; Procházka, P.; Čechal, J., 2024: How the Support Defines Properties of 2D Metal–Organic Frameworks: Fe-TCNQ on Graphene versus Au(111). JOURNAL OF THE AMERICAN CHEMICAL SOCIETY 146(5), p. 3471 - 3482, doi: 10.1021/jacs.3c13212; FULL TEXT
  (UHV-DEPOSITION, UHV-LEEM, UHV-XPS, UHV-PREPARATION, UHV-SPM)
• AVVAL, T.; PRŮŠA, S.; ČECHAL, J.; CUSHMAN, C. V.; HODGES, G. T.; FEARN, S.; KIM, S. H.;ČECHAL, J.; VANÍČKOVÁ, E.; BÁBÍK, P.; ŠIKOLA, T.; BRONGERSMA, H. H.; LINFORD, M. R., 2023: A tag-and-count approach for quantifying surface silanol densities on fused silica based on atomic layer deposition and high-sensitivity low-energy ion scattering. APPLIED SURFACE SCIENCE 607, p. 154551 - 9, doi: 10.1016/j.apsusc.2022.154551; FULL TEXT
  (UHV-LEIS, UHV-XPS)
• KACHTÍK, L.; CITTERBERG, D.; BUKVIŠOVÁ, K.; KEJÍK, L.; LIGMAJER, F.; KOVAŘÍK, M.; MUSÁLEK, T.; KRISHNAPPA, M.; ŠIKOLA, T.; KOLÍBAL, M., 2023: Chiral Nanoparticle Chains on Inorganic Nanotube Templates. NANO LETTERS 23(13), p. 6010 - 8, doi: 10.1021/acs.nanolett.3c01213; FULL TEXT
  (KRATOS-XPS, UHV-XPS, UHV-DEPOSITION)
• David, J., 2023: Preparation of elementary 2D materials and heterostructures. MASTER´S THESIS , p. 1 - 69; FULL TEXT
  (UHV-DEPOSITION, UHV-PREPARATION, UHV-LEEM, UHV-XPS, UHV-SPM)
• Makoveev, A. O., 2023: Molecular self-assembly on surfaces: the role of coverage, surface orientation and kinetics. PH.D. THESIS , p. 1 - 169; FULL TEXT
  (UHV-DEPOSITION, UHV-LEEM, UHV-XPS, UHV-PREPARATION, UHV-SPM)

• MAKOVEEV, A.; PROCHÁZKA, P.; BLATNIK, M.; KORMOŠ, L.; SKÁLA, T.; ČECHAL, J., 2022: Role of Phase Stabilization and Surface Orientation in 4,4 ´-Biphenyl-Dicarboxylic Acid Self-Assembly and Transformation on Silver Substrates. JOURNAL OF PHYSICAL CHEMISTRY C (WEB) 126(23), p. 9989 - 9, doi: 10.1021/acs.jpcc.2c02538; FULL TEXT
  (UHV-PREPARATION, UHV-DEPOSITION, UHV-LEEM, UHV-SPM, UHV-XPS)
• JAKUB, Z.; KUROWSKÁ, A.; HERICH, O.; ČERNÁ, L.; KORMOŠ, L.; SHAHSAVAR, A.; PROCHÁZKA, P.; ČECHAL, J., 2022: Remarkably stable metal-organic frameworks on an inert substrate: M-TCNQ on graphene (M = Ni, Fe, Mn). NANOSCALE 14(26), p. 9507 - 9, doi: 10.1039/d2nr02017c; FULL TEXT
  (UHV-DEPOSITION, UHV-LEEM, UHV-XPS, UHV-PREPARATION, UHV-SPM)
• MAKOVEEV, A.; PROCHÁZKA, P.; SHAHSAVAR, A.; KORMOŠ, L.; KRAJŇÁK, T.; STARÁ, V.; ČECHAL, J., 2022: Kinetic control of self-assembly using a low-energy electron beam. APPLIED SURFACE SCIENCE 600, p. 154106 - 7, doi: 10.1016/j.apsusc.2022.154106; FULL TEXT
  (UHV-DEPOSITION, UHV-LEEM, UHV-XPS, UHV-PREPARATION, UHV-SPM)
• STARÁ, V.; PROCHÁZKA, P.; PLANER, J.; SHAHSAVAR, A.; MAKOVEEV, A.; SKÁLA, T.; BLATNIK, M.; ČECHAL, J., 2022: Tunable Energy-Level Alignment in Multilayers of Carboxylic Acids on Silver. PHYSICAL REVIEW APPLIED 18(4), doi: 10.1103/PhysRevApplied.18.044048; FULL TEXT
  (UHV-DEPOSITION, UHV-PREPARATION, UHV-LEEM, UHV-SPM, UHV-XPS)
• PROCHÁZKA, P.; KORMOŠ, L.; SHAHSAVAR, A.; STARÁ, V.; MAKOVEEV, A.; SKÁLA, T.; BLATNIK, M.; ČECHAL, J., 2021: Phase transformations in a complete monolayer of 4,4 ´-biphenyl-dicarboxylic acid on Ag(001). APPLIED SURFACE SCIENCE 547, p. 149115- - 7, doi: 10.1016/j.apsusc.2021.149115; FULL TEXT
  (UHV-DEPOSITION, UHV-PREPARATION, UHV-SPM, UHV-XPS, UHV-LEEM)
• Zadorozhnii, O., 2021: Exchange bias in metamagnetic heterostructures. MASTER´S THESIS , p. 1 - 81; FULL TEXT
  (MAGNETRON, VERSALAB, KERR-MICROSCOPE, RAITH, RIE-FLUORINE, UHV-DEPOSITION, UHV-PREPARATION, UHV-XPS, LYRA)
• Kormoš, L., 2021: 2D molecular systems at surfaces. PH.D. THESIS , p. 1 - 140; FULL TEXT
  (UHV-DEPOSITION, UHV-PREPARATION, UHV-XPS, UHV-LEEM, UHV-SPM, EVAPORATOR)
• PROCHÁZKA, P.; GOSALVEZ, M.; KORMOŠ, L.; DE LA TORRE, B.; GALLARDO, A.; ALBERDI-RODRIGUEZ, J.; CHUTORA, T.; MAKOVEEV, A.; SHAHSAVAR, A.; ARNAU, A.; JELÍNEK, P.; ČECHAL, J., 2020: Multiscale Analysis of Phase Transformations in Self-Assembled Layers of 4,4 ´-Biphenyl Dicarboxylic Acid on the Ag(001) Surface. ACS NANO 14(6), p. 7269 - 11, doi: 10.1021/acsnano.0c02491; FULL TEXT
  (UHV-LEEM, UHV-SPM, UHV-XPS, UHV-PREPARATION, UHV-DEPOSITION)
• FIKÁČEK, J.; PROCHÁZKA, P.; STETSOVYCH, V.; PRŮŠA, S.; VONDRÁČEK, M.; KORMOŠ, L.; SKÁLA, T.; VLAIC, P.; CAHA, O.; CARVA, K.; ČECHAL, J.; SPRINGHOLZ, G.; HONOLKA, J., 2020: Step-edge assisted large scale FeSe monolayer growth on epitaxial Bi(2)Se(3)thin films. NEW JOURNAL OF PHYSICS 22(7), p. 1 - 12, doi: 10.1088/1367-2630/ab9b59; FULL TEXT
  (UHV-LEEM, UHV-XPS, UHV-LEIS, UHV-DEPOSITION, UHV-PREPARATION)
• KORMOŠ, L.; PROCHÁZKA, P.; MAKOVEEV, A.; ČECHAL, J., 2020: Complex k-uniform tilings by a simple bitopic precursor self-assembled on Ag(001) surface. NATURE COMMUNICATIONS 11(1), p. 1 - 6, doi: 10.1038/s41467-020-15727-6; FULL TEXT
  (UHV-DEPOSITION, UHV-PREPARATION, UHV-LEEM, UHV-SPM, UHV-XPS)
• UHLÍŘ, V.; PRESSACCO, F.; ARREGI URIBEETXEBARRIA, J.; PROCHÁZKA, P.; PRŮŠA, S.; POTOČEK, M.; ŠIKOLA, T.; ČECHAL, J.; BENDOUNAN, A.; SIROTTI, F., 2020: Single-layer graphene on epitaxial FeRh thin films. APPLIED SURFACE SCIENCE 514, p. 145923-1 - 7, doi: 10.1016/j.apsusc.2020.145923; FULL TEXT
  (MAGNETRON, VERSALAB, RIGAKU9, UHV-LEEM, UHV-LEIS, UHV-SPM, UHV-PREPARATION, UHV-XPS, SIMS)
• GLOSS, J.; HORKÝ, M.; KŘIŽÁKOVÁ, V.; FLAJŠMAN, L.; SCHMID, M.; URBÁNEK, M.; VARGA, P., 2019: The growth of metastable fcc Fe78Ni22 thin films on H-Si(100) substrates suitable for focused ion beam direct magnetic patterning. APPLIED SURFACE SCIENCE 469, p. 747 - 6, doi: 10.1016/j.apsusc.2018.10.263; FULL TEXT
  (KERR-MICROSCOPE, UHV-DEPOSITION, UHV-PREPARATION, UHV-XPS, LYRA, ICON-SPM)
• URBÁNEK, M.; FLAJŠMAN, L.; KŘIŽÁKOVÁ, V.; GLOSS, J.; HORKÝ, M.; SCHMID, M.; VARGA, P., 2018: Research Update: Focused ion beam direct writing of magnetic patterns with controlled structural and magnetic properties. APL MATERIALS 6(6), p. 060701-1 - 7, doi: 10.1063/1.5029367; FULL TEXT
  (HELIOS, UHV-XPS, UHV-PREPARATION, UHV-DEPOSITION, RIGAKU9, KERR-MICROSCOPE, LYRA, ICON-SPM)
• Makoveev, A., 2018: Functional properties of 2D supramolecular nanoarchitectures. TREATISE TO STATE DOCTORAL EXAM , p. 1 - 32
  (UHV-LEEM, UHV-MBE, UHV-XPS, UHV-PREPARATION, UHV-SPM)
• Horký, M., 2016: Growth of Metastable FCC FE Thin Films on Cu(100)/Si(100) Substrates. MASTER´S THESIS , p. 1 - 96
  (UHV-PREPARATION, UHV-XPS, UHV-SPM, VERIOS, UHV-LEIS, KRATOS-XPS, RIGAKU3, LYRA, ICON-SPM)

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