UHV Preparation and Analytical system - Photoelectron Spectroscopy SPECS Phoibos 150 (UHV-XPS)

Description:

The chamber for photoelectron spectroscopy analysis (UHV-XPS) is one of the instruments of the UHV-Cluster, which combines preparation and in-situ analysis by several complementary methods for the characterization of surfaces and thin films.
The instrument is equipped with the Al Kα and Mg Kα X-ray sources which provide photons with 1486.6eV and 1254.6eV energy respectively and He I/II UV source providing photons with energies of 21.22eV and 40.81eV respectively. The photoelectrons are analyzed in a hemispherical detector in which lens voltages direct the electron onto a two-dimensional (energy, momentum) multi-channel plate allowing for angular-resolved photoelectron spectroscopy (ARPES) experiments.

Publications:

• Mirdamadi, H.; Wang, R.; David, J.; Jiang, T.; Wang, Y.; Vařeka, K.; Dymáček, M.; Bábor, P.; Šikola, T.; Kolíbal, M., 2026: . ACS NANO 20(10), p. 8255 - 8265, doi: 10.1021/acsnano.5c12130; FULL TEXT
  (UHV-DEPOSITION, UHV-LEEM, UHV-XPS, SIMS)
• ČECHAL, J.; STARÁ, V.; KUROWSKÁ, A.; BLATNIK, M.; PRAVEC, D.; HRUBÁ, D.; KUNC, J.; DRASAR, C.; PLANER, J.; PROCHÁZKA, P., 2026: Structural, electronic, and chemical manifestations of weak molecule-substrate coupling on Bi2Se3 compared with Ag, Au, and graphene. APPLIED SURFACE SCIENCE ADVANCES , doi: 10.1016/j.apsadv.2025.100927; FULL TEXT
  (UHV-LEEM, UHV-PREPARATION, UHV-XPS, UHV-SPM)
• JAKUB, Z.; PLANER, J.; HRŮZA, D.; ENDSTRASSER, Z.; PROCHÁZKA, P.; ČECHAL, J., 2025: Atomically-defined on-surface synthesis of multilayer metal-organic frameworks. COMMUNICATIONS CHEMISTRY 8(1), doi: 10.1038/s42004-025-01742-5; FULL TEXT
  (UHV-DEPOSITION, UHV-XPS, UHV-SPM, UHV-PREPARATION)
• PROCHÁZKA, P.; STARÁ, V.; PLANER, J.; SKÁLA, T.; ČECHAL, J., 2025: Structure of epitaxial heteromolecular bilayers probed by low-energy electron microscopy. SURFACES AND INTERFACES 62, p. 106251-1 - 106251-8, doi: 10.1016/j.surfin.2025.106251; FULL TEXT
  (UHV-LEEM, UHV-XPS, UHV-PREPARATION, UHV-SPM)
• JAKUB, Z.; PLANER, J.; HRŮZA, D.; TRLLOVÁ SHAHSAVAR, A.; PAVELEC, J.; ČECHAL, J., 2025: Identical Fe-N₄ Sites with Different Reactivity: Elucidating the Effect of Support Curvature. ACS APPLIED MATERIALS & INTERFACES 17(6), p. 10136 - 10144, doi: 10.1021/acsami.4c19913; FULL TEXT
  (UHV-CLUSTER, UHV-DEPOSITION, UHV-PREPARATION, UHV-SPM, UHV-XPS)

• VANÍČKOVÁ, E.; PRŮŠA, S.; ŠIKOLA, T., 2024: . NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIO 553, doi: 10.1016/j.nimb.2024.165385; FULL TEXT
  (UHV-MBE, UHV-LEIS, UHV-XPS)
• KRAJŇÁK, T.; STARÁ, V.; PROCHÁZKA, P.; PLANER, J.; SKÁLA, T.; BLATNIK, M.; ČECHAL, J., 2024: . ACS APPLIED MATERIALS & INTERFACES 16(14), p. 18099 - 13, doi: 10.1021/acsami.3c18697; FULL TEXT
  (UHV-LEEM, UHV-XPS, UHV-PREPARATION, UHV-SPM, UHV-DEPOSITION)
• JAKUB, Z.; TRLLOVÁ SHAHSAVAR, A.; PLANER, J.; HRŮZA, D.; HERICH, O.; PROCHÁZKA, P.; ČECHAL, J., 2024: . JOURNAL OF THE AMERICAN CHEMICAL SOCIETY 146(5), p. 3471 - 12, doi: 10.1021/jacs.3c13212; FULL TEXT
  (UHV-DEPOSITION, UHV-LEEM, UHV-XPS, UHV-PREPARATION, UHV-SPM)
• Kurowská, A., 2023: . MASTER'S THESIS , p. 1 - 61; FULL TEXT
  (UHV-LEEM, UHV-MBE, UHV-PREPARATION, UHV-SPM, UHV-XPS)
• Makoveev, A. O., 2023: . PH.D. THESIS , p. 1 - 169; FULL TEXT
  (UHV-DEPOSITION, UHV-LEEM, UHV-XPS, UHV-PREPARATION, UHV-SPM)
• David, J., 2023: . MASTER'S THESIS , p. 1 - 69; FULL TEXT
  (UHV-DEPOSITION, UHV-PREPARATION, UHV-LEEM, UHV-XPS, UHV-SPM)
• KACHTÍK, L.; CITTERBERG, D.; BUKVIŠOVÁ, K.; KEJÍK, L.; LIGMAJER, F.; KOVAŘÍK, M.; MUSÁLEK, T.; KRISHNAPPA, M.; ŠIKOLA, T.; KOLÍBAL, M., 2023: . NANO LETTERS 23(13), p. 6010 - 8, doi: 10.1021/acs.nanolett.3c01213; FULL TEXT
  (UHV-XPS, UHV-DEPOSITION, KRATOS-XPS)
• AVVAL, T.; PRŮŠA, S.; ČECHAL, J.; CUSHMAN, C. V.; HODGES, G. T.; FEARN, S.; KIM, S. H.;ČECHAL, J.; VANÍČKOVÁ, E.; BÁBÍK, P.; ŠIKOLA, T.; BRONGERSMA, H. H.; LINFORD, M. R., 2023: . APPLIED SURFACE SCIENCE 607, p. 154551 - 9, doi: 10.1016/j.apsusc.2022.154551; FULL TEXT
  (UHV-LEIS, UHV-XPS)
• STARÁ, V.; PROCHÁZKA, P.; PLANER, J.; SHAHSAVAR, A.; MAKOVEEV, A.; SKÁLA, T.; BLATNIK, M.; ČECHAL, J., 2022: . PHYSICAL REVIEW APPLIED 18(4), doi: 10.1103/PhysRevApplied.18.044048; FULL TEXT
  (UHV-DEPOSITION, UHV-PREPARATION, UHV-LEEM, UHV-SPM, UHV-XPS)
• MAKOVEEV, A.; PROCHÁZKA, P.; SHAHSAVAR, A.; KORMOŠ, L.; KRAJŇÁK, T.; STARÁ, V.; ČECHAL, J., 2022: . APPLIED SURFACE SCIENCE 600, p. 154106 - 7, doi: 10.1016/j.apsusc.2022.154106; FULL TEXT
  (UHV-DEPOSITION, UHV-LEEM, UHV-XPS, UHV-PREPARATION, UHV-SPM)
• JAKUB, Z.; KUROWSKÁ, A.; HERICH, O.; ČERNÁ, L.; KORMOŠ, L.; SHAHSAVAR, A.; PROCHÁZKA, P.; ČECHAL, J., 2022: . NANOSCALE 14(26), p. 9507 - 9, doi: 10.1039/d2nr02017c; FULL TEXT
  (UHV-DEPOSITION, UHV-LEEM, UHV-XPS, UHV-PREPARATION, UHV-SPM)
• MAKOVEEV, A.; PROCHÁZKA, P.; BLATNIK, M.; KORMOŠ, L.; SKÁLA, T.; ČECHAL, J., 2022: . JOURNAL OF PHYSICAL CHEMISTRY C (WEB) 126(23), p. 9989 - 9, doi: 10.1021/acs.jpcc.2c02538; FULL TEXT
  (UHV-PREPARATION, UHV-DEPOSITION, UHV-LEEM, UHV-SPM, UHV-XPS)
• Kormoš, L., 2021: . PH.D. THESIS , p. 1 - 140; FULL TEXT
  (UHV-DEPOSITION, UHV-PREPARATION, UHV-XPS, UHV-LEEM, UHV-SPM, EVAPORATOR)
• Zadorozhnii, O., 2021: . MASTER'S THESIS , p. 1 - 81; FULL TEXT
  (MAGNETRON, VERSALAB, KERR-MICROSCOPE, RAITH, RIE-FLUORINE, UHV-DEPOSITION, UHV-PREPARATION, UHV-XPS, LYRA)
• PROCHÁZKA, P.; KORMOŠ, L.; SHAHSAVAR, A.; STARÁ, V.; MAKOVEEV, A.; SKÁLA, T.; BLATNIK, M.; ČECHAL, J., 2021: . APPLIED SURFACE SCIENCE 547, p. 149115- - 7, doi: 10.1016/j.apsusc.2021.149115; FULL TEXT
  (UHV-DEPOSITION, UHV-PREPARATION, UHV-SPM, UHV-XPS, UHV-LEEM)
• FIKÁČEK, J.; PROCHÁZKA, P.; STETSOVYCH, V.; PRŮŠA, S.; VONDRÁČEK, M.; KORMOŠ, L.; SKÁLA, T.; VLAIC, P.; CAHA, O.; CARVA, K.; ČECHAL, J.; SPRINGHOLZ, G.; HONOLKA, J., 2020: . NEW JOURNAL OF PHYSICS 22(7), p. 1 - 12, doi: 10.1088/1367-2630/ab9b59; FULL TEXT
  (UHV-LEEM, UHV-XPS, UHV-LEIS, UHV-DEPOSITION, UHV-PREPARATION)
• PROCHÁZKA, P.; GOSALVEZ, M.; KORMOŠ, L.; DE LA TORRE, B.; GALLARDO, A.; ALBERDI-RODRIGUEZ, J.; CHUTORA, T.; MAKOVEEV, A.; SHAHSAVAR, A.; ARNAU, A.; JELÍNEK, P.; ČECHAL, J., 2020: . ACS NANO 14(6), p. 7269 - 11, doi: 10.1021/acsnano.0c02491; FULL TEXT
  (UHV-LEEM, UHV-SPM, UHV-XPS, UHV-PREPARATION, UHV-DEPOSITION)
• UHLÍŘ, V.; PRESSACCO, F.; ARREGI URIBEETXEBARRIA, J.; PROCHÁZKA, P.; PRŮŠA, S.; POTOČEK, M.; ŠIKOLA, T.; ČECHAL, J.; BENDOUNAN, A.; SIROTTI, F., 2020: . APPLIED SURFACE SCIENCE 514, p. 145923-1 - 7, doi: 10.1016/j.apsusc.2020.145923; FULL TEXT
  (MAGNETRON, VERSALAB, RIGAKU9, UHV-LEEM, UHV-LEIS, UHV-SPM, UHV-PREPARATION, UHV-XPS, SIMS)
• KORMOŠ, L.; PROCHÁZKA, P.; MAKOVEEV, A.; ČECHAL, J., 2020: . NATURE COMMUNICATIONS 11(1), p. 1 - 6, doi: 10.1038/s41467-020-15727-6; FULL TEXT
  (UHV-DEPOSITION, UHV-PREPARATION, UHV-LEEM, UHV-SPM, UHV-XPS)
• GLOSS, J.; HORKÝ, M.; KŘIŽÁKOVÁ, V.; FLAJŠMAN, L.; SCHMID, M.; URBÁNEK, M.; VARGA, P., 2019: . APPLIED SURFACE SCIENCE 469, p. 747 - 6, doi: 10.1016/j.apsusc.2018.10.263; FULL TEXT
  (KERR-MICROSCOPE, UHV-DEPOSITION, UHV-PREPARATION, UHV-XPS, LYRA, ICON-SPM)
• URBÁNEK, M.; FLAJŠMAN, L.; KŘIŽÁKOVÁ, V.; GLOSS, J.; HORKÝ, M.; SCHMID, M.; VARGA, P., 2018: . APL MATERIALS 6(6), p. 060701-1 - 7, doi: 10.1063/1.5029367; FULL TEXT
  (HELIOS, UHV-XPS, UHV-PREPARATION, UHV-DEPOSITION, RIGAKU9, KERR-MICROSCOPE, LYRA, ICON-SPM)
• Makoveev, A., 2018: . TREATISE TO STATE DOCTORAL EXAM , p. 1 - 32
  (UHV-LEEM, UHV-MBE, UHV-XPS, UHV-PREPARATION, UHV-SPM)
• Horký, M., 2016: . MASTER'S THESIS , p. 1 - 96
  (UHV-PREPARATION, UHV-XPS, UHV-SPM, VERIOS, UHV-LEIS, RIGAKU3, LYRA, ICON-SPM, KRATOS-XPS)

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