Electron beam evaporator BESTEC (EVAPORATOR)

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Guarantor: Jan Prášek, Ph.D.
Technology / Methodology: Etching & Deposition
Instrument status: Operational Operational, 30.5.2025 11:44
Equipment placement: CEITEC Nano - C1.36
Research group: CF: CEITEC Nano


Description:

The UHV physical vapor deposition system for thin-film e-beam deposition (mostly metals). A carousel for eight different materials, substrate rotation, and tilting is available.


Publications:

  • DODD, S.; GUDINO, N.; ZADOROZHNII, O.; STAŇO, M.; HAJDUČEK, J.; ARREGI URIBEETXEBARRIA, J.; MORRIS, H.; UHLÍŘ, V.; BARBIC, M.; KORETSKY, A., 2025: Field switching of microfabricated metamagnetic FeRh MRI contrast agents. SCIENTIFIC REPORTS 15(1), p. 1 - 10, doi: 10.1038/s41598-025-85384-6; FULL TEXT
    (MAGNETRON, VERSALAB, MIRA-EBL, EVAPORATOR, RIE-FLUORINE, ICON-SPM, KERR-MICROSCOPE)
  • Martyniuk, O.; Chaudhary, V.; Rhanbouri, MA.; Laguta, O.; Tahsin, M.; Gaskill, DK.; El Fatimy,A .; Neugebauer, P., 2025: Quantum dots array: an approach to multipixel devices. JOURNAL OF PHYSICS D - APPLIED PHYSICS 58(13), doi: 10.1088/1361-6463/adacf8; FULL TEXT
    (KRATOS-XPS, EVAPORATOR, RAITH, CRYOGENIC)
  • Wang, Y.; Guo, M.; Davídková, K.; Verba, R.; Guo, X.; Dubs, C.; Chumak, A. V.; Pirro, P.; Wang, Q., 2025: Fast switchable unidirectional forward volume spin-wave emitter. PHYSICAL REVIEW APPLIED 23(1), doi: 10.1103/PhysRevApplied.23.014066; FULL TEXT
    (MIRA-EBL, RIE-FLUORINE, SCIA, EVAPORATOR)
  • KLÍMA, J.; WOJEWODA, O.; ROUČKA, V.; MOLNÁR, T.; HOLOBRÁDEK, J.; URBÁNEK, M., 2024: Zero-field spin wave turns. APPLIED PHYSICS LETTERS 124(11), doi: 10.1063/5.0189394; FULL TEXT
    (BRILLOUIN, EVAPORATOR, LYRA, KERR-MICROSCOPE, RAITH, ICON-SPM)
  • Kunc, J.; Fridrišek, T.; Shestopalov, M.; Jo, J.; Park, K., 2024: Graphene–insulator–metal diodes: Enhanced dielectric strength of the Al2O3 barrier. AIP ADVANCES 14(9), p. 1 - 9, doi: 10.1063/5.0223763; FULL TEXT
    (RAITH, RIE-FLUORINE, ALD, EVAPORATOR, WIRE-BONDER, KRATOS-XPS)

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