EuroNanoLab Dry Etch Process Meeting June 6-7 2019

About Event

3rd Meeting on Dry Etching Process organized by CEITEC Nano Research Infrastructure.

EUROnanoLAB - Setting up a European infrastructure that incorporates most of the academic clean rooms in which tomorrow’s nanosystems will be designed is the goal of the EuroNanoLab project. CEITEC Nano is a founding partner of EuroNanoLab consortium.

Preliminary Program:

Thursday, June 6, 2019

9:00		Welcome at CEITEC BUT - Conference room at Building "S" 1st floor
9:30–12:30		Morning Lectures
		Etching of III-V materials Stephane Guilet (C2N): "Plasma etching : Is it really possible to use the same recipe in different machines ? What are the limits ?" Chevolleau Thierry (LTM CNRS-UGA): “Development of etching processes of III-V materials from the nanometer scale to the micrometer scale” Martijn de Roosz (NTNU NanoLab): “BCl3 issues: Are there any alternatives for this process gas?“
		Coffe Break
		Etching of Silicon: Aurelie Lecestre (LAAS): “One Si etching process used in 3 differents equipments (RIE; RIE-ICP; DRIE-ICP)“ Djaffar Belharet (Femto-ST): Presentation about Bosch process possibilities on SPTS machines, from classic bosch (2 steps), bosch process using 3 steps and the bosch process using 4 steps (C4F8, O2, Ar, SF6) Black Silicon Kaiying Wang (USN): “Metal-mask assisted Bosch etching for nanostructured black silicon”
12:30–13:30		Lunch
13:30–17:00		Afternoon Lectures
		Documentation Christiaan Bruinink (MESA+ NanoLab): status, update forum and equipment database CEITEC Nano Users experiences Jiri Liska: "Preparation of SiN nanopores using RIE technique." Peter Fecko: "Smooth wall profile with Bosch process silicon etching." Silicon Etching; notching Dmitri Yarekha (Univ-Lille): Presentation about the notching issue on our Estrelas system
		Coffee Break
		New expert members: Christoph Seiffert: "MiNaLab at the University of Oslo" Lorenza Ferrario and Sabina Ronchin (FBK – MTlab Trentino): An overview of RIE and DRIE technology at FBK cleanroom: chemistry, material processed, main results
17:00–18:00		Clean Room Labs Excursion
18:00		Transfer to Brno's Dam
19:00–21:30		Evening program

Friday, June 7, 2019

9:00–12:00		Morning Lectures
		Endpoint detection Nils Nordell (KTH): the Ionfab 300Plus from Oxford is equipped with two EPD. A spectrometer from Verity (SD1024) and a retractable SIMS from Hiden. Christoph Seifert (MiNaLab Oslo): Presentation about endpoint detection techniques
		Coffee Break
		Djaffar Belharet (FEMTO-ST): end point detection methods, results obtained by the Claritas system which is integrated on Rapier machines (based on OES technique)
		Next Meeting on Dry Etching
12:00–13:00		Lunch
13:00		End of Meeting

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EuroNanoLab Dry Etch Process Meeting June 6-7 2019

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