Focused Ion Beam/Scanning Electron Microscope TESCAN LYRA3 (LYRA)

CONTACT US

Guarantor: Tomáš Šamořil, Ph.D.
Technology / Methodology: Probe microscopy & Nanomanipulation
Instrument status: Operational Operational, 17.4.2024 11:09
Equipment placement: CEITEC Nano - C1.24
Research group: CF: CEITEC Nano


Description:

Facility for novel methods for lithographic fabrication and manipulation of nanostructures combining Scanning Electron Microscope and Focused Ion Beam Source (i.e. “Dual Beam”) equipped with 4 nanomanipulators (and photon detectors); Scanning Probe Microscopy for Fabrication of Nanostructures by local anodic oxidation and other methods.


Publications:

  • Nouseen, S.; Ghosh, K.; Pumera, M., 2024: Hydrofluoric acid-free etched MAX on 3D-printed nanocarbon electrode for photoelectrochemical hydrogen production. APPLIED MATERIALS TODAY 36, doi: 10.1016/j.apmt.2023.101995; FULL TEXT
    (RIGAKU3, VERIOS, LYRA, KRATOS-XPS, JASCO)
  • KEPIČ, P.; LIŠKA, P.; IDESOVÁ, B.; CAHA, O.; LIGMAJER, F.; ŠIKOLA, T., 2024: Pulsed laser deposition of Sb2S3 films for phase-change tunable nanophotonics. NEW JOURNAL OF PHYSICS 26(1), p. 1 - 8, doi: 10.1088/1367-2630/ad1696; FULL TEXT
    (ICON-SPM, KRATOS-XPS, LYRA, ALD, WITEC-RAMAN, RIGAKU9, WOOLLAM-VIS)
  • Bevz, VM.; Mikhailov, MY.; Budinska, B.; Lamb-Camarena, S.; Shpilinska, SO.; Chumak, AV.; Urbanek, M.; Arndt, M.; Lang, W.; Dobrovolskiy, OV., 2023: Vortex Counting and Velocimetry for Slitted Superconducting Thin Strips. PHYSICAL REVIEW APPLIED 19(3), doi: 10.1103/PhysRevApplied.19.034098; FULL TEXT
    (DWL, LYRA, EVAPORATOR)
  • PONGRÁCZ, J.; VACEK, P.; GRÖGER, R., 2023: Recombination activity of threading dislocations in MOVPE-grown AlN/Si {111} films etched by phosphoric acid. JOURNAL OF APPLIED PHYSICS 134(19), doi: 10.1063/5.0171937; FULL TEXT
    (LYRA, ICON-SPM, HELIOS, TITAN, LEICACOAT-NANO)
  • Hu, S.; Wang, D.; Křemenáková, D.; Militký, J., 2023: Washable and breathable ultrathin copper-coated nonwoven polyethylene terephthalate (PET) fabric with chlorinated poly-para-xylylene (parylene-C) encapsulation for electromagnetic interference shielding application. TEXTILE RESEARCH JOURNAL , doi: 10.1177/00405175231168418; FULL TEXT
    (PARYLENE, LYRA)

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