Magneto-optical Kerr microscope (KERR-MICROSCOPE)

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Guarantor: Lukáš Flajšman
Instrument status: Operational Operational, 10.9.2019 17:21
Equipment placement: CEITEC Nano - C1.57
Research group: CF: CEITEC Nano


Detailed description:

Kerr Microscope system is facility for the visualisation of magnetic domains and magnetization processes as well as for optically recording magnetization curves on all kinds of magnetic materials, including bulk specimens like sheets or ribbons, magnetic films and multilayers, patterned films or micro- and nanowires. They are semi-automatic, contact-less, non-destructive measuring systems using the magneto-optical Kerr effect (MOKE) as contrast mechanism. The microscope is equipped with rotable in-plane magnet with maximum field of 0.3 T. Automatic off-axial light system allows for automatic and simultaneous visualization of all the components of magnetization vector.


Publications:

  • Gloss, J.; Horký, M.; Křižáková, V.; Flajšman, L.; Schmid, M.; Urbánek, M.; Varga, P., 2019: The growth of metastable fcc Fe78Ni22 thin films on H-Si (100) substrates suitable for focused ion beam direct magnetic patterning. APPLIED SURFACE SCIENCE 469, p. 747 - 752, doi: 10.1016/j.apsusc.2018.10.263
    (LYRA, UHV-XPS, UHV-PREPARATION, UHV-DEPOSITION, ICON-SPM, KERR-MICROSCOPE)
  • Křižáková, V., 2018: Spin wave excitation and propagation in magnonic crystals prepared by focused ion beam direct writing. MASTER´S THESIS , p. 1 - 83
    (LYRA, HELIOS, ICON-SPM, MIRA, EVAPORATOR, WIRE-BONDER, KERR-MICROSCOPE)
  • Urbánek, M.; Flajšman, L.; Křižáková, V.; Gloss, J.; Horký, M.; Schmid, M.; Varga, P., 2018: Research Update: Focused ion beam direct writing of magnetic patterns with controlled structural and magnetic properties. APL MATERIALS 6(6), p. 060701-1 - 060701-7, doi: 10.1063/1.5029367
    (LYRA, HELIOS, UHV-XPS, UHV-PREPARATION, UHV-DEPOSITION, ICON-SPM, RIGAKU9, KERR-MICROSCOPE)