Mask Aligner, NanoImprint Lithography SÜSS MicroTec MA8/BA8 Gen3 (SUSS-MA8)

CONTACT US

Guarantor: Vojtěch Švarc, Ph.D.
Technology / Methodology: Nanolitography infrastructure
Instrument status: Operational Operational, 27.5.2025 12:45, Theta TSA axis in the state of observation
Equipment placement: CEITEC Nano - C1.30
Research group: CF: CEITEC Nano


Description:

The Süss MicroTec MA8 is a standard UV lithography tool for exposing wafers through the mask. Exposure can be carried out in proximity mode or in contact mode. The MA8 is equipped with top side optical microscopes and bottom side microscopes, so alignment is possible from both sides of the wafer.


Publications:

  • Děcký, M., 2025: . MASTER'S THESIS , p. 1 - 63; FULL TEXT
    (MIRA-EBL, SUSS-MA8, DEKTAK, NANOCALC, MAGNETRON, RIE-FLUORINE, EVAPORATOR, WIRE-BONDER, MPS150, LYRA, LASER-DICER)
  • Liu, X.; Brodský, J.; Vírostko, J.; Jarušek, J.; Migliaccio, L.; Zítka, O.; Gablech, I.; Neužil, P., 2025: . SCIENTIFIC REPORTS 15(1), doi: 10.1038/s41598-025-24442-5; FULL TEXT
    (DRIE, SUSS-MA8, RIE-FLUORINE)
  • TAKHSHA, M.; SINGH, V.; LEDIEU, J.; FABBRICI, S.; CASOLI, F.; MEZZADRI, F.; HORKÝ, M.; FOURNEE, V.; UHLÍŘ, V.; ALBERTINI, F., 2025: Magnetic Manipulation of Spatially Confined Multiferroic Heuslers by Martensitic Microstructure Engineering. SMALL STRUCTURES 6(11), p. 1 - 12, doi: 10.1002/sstr.202500284; FULL TEXT
    (VERIOS, VERSALAB, SUSS-MA8, RIE-FLUORINE, KERR-MICROSCOPE)
  • SUPALOVÁ, L.; BARTOŠÍK, M.; ŠVARC, V.; MACH, J.; PIASTEK, J.; ŠPAČEK, O.; KONEČNÝ, M.; ŠIKOLA, T., 2025: High-Temperature Ultrasensitive FET-Based CVD Graphene Hall Probes. ACS APPLIED ELECTRONIC MATERIALS 7(13), p. 5889 - 5897, doi: 10.1021/acsaelm.5c00351; FULL TEXT
    (DWL, SUSS-MA8, EVAPORATOR, MIRA-EBL, RIE-FLUORINE, WIRE-BONDER, WITEC-RAMAN, LYRA)
  • Brodský, J.; Liu, X.; Jarušek, J.; Migliaccio, L.; Neužil, P.; Zítka, O.; Gablech, I., 2025: . SENSORS AND ACTUATORS A: PHYSICAL 392, p. 1 - 6, doi: 10.1016/j.sna.2025.116719; FULL TEXT
    (SUSS-MA8, RIE-FLUORINE, DRIE)

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