Mask Aligner, NanoImprint Lithography SÜSS MicroTec MA8/BA8 Gen3 (SUSS-MA8)

CONTACT US

Guarantor: Vojtěch Švarc
Technology / Methodology: Nanolitography infrastructure
Instrument status: Some Issues Some Issues, 26.2.2019 16:52, WEC Head error. Use only detector 365nm in constant dose mode.
Equipment placement: CEITEC Nano - C1.30
Research group: CF: CEITEC Nano


Detailed description:

Resist mask preparation for fabrication of nano and microstructures with ultimate dimensions below 50 nm. Includes resist spin coating facility, complete photolithography setup and electron beam lithography / shared by CEITEC users, open facilities


Publications:

  • Brodský, J., 2019: Characterization of graphene elecrical properties on MEMS structures. BACHELOR´S THESIS , p. 1 - 50
    (MPS150, RAMAN, EVAPORATOR, DRIE, PECVD, DWL, SUSS-MA8, RIE-FLUORINE, RIE-CHLORINE, DIENER, SCIA)
  • Fecko, P., 2019: Gecko mimicking surfaces. MASTER´S THESIS , p. 1 - 52
    (SUSS-RCD8, SUSS-MA8, DWL, DRIE, LYRA, ALD, RIE-FLUORINE, ICON-SPM)
  • Podesva, P; Gablech, I; Neuzil, P., 2018: Nanostructured Gold Microelectrode Array for Ultrasensitive Detection of Heavy Metal Contamination. ANALYTICAL CHEMISTRY 90(2), p. 1161 - 1167, doi: 10.1021/acs.analchem.7b03725
    (SUSS-MA8, DWL, SCIA, DIENER)
  • Gablech, I; Somer, J; Fohlerova, Z; Svatos, V; Pekarek, J; Kurdik, S; Feng, JG; Fecko, P; Podesva, P; Hubalek, J; Neuzil, P, 2018: Fabrication of buried microfluidic channels with observation windows using femtosecond laser photoablation and parylene-C coating. MICROFLUIDICS AND NANOFLUIDICS 22(9), doi: 10.1007/s10404-018-2125-6
    (DRIE, DWL, SUSS-MA8)
  • Vančík, S., 2018: MEMS microhotplate platform for chemical sensors. MASTER´S THESIS , p. 1 - 68
    (DWL, ALD, MAGNETRON, EVAPORATOR, RIE-FLUORINE, SUSS-MA8, DEKTAK, MPS150, RIE-CHLORINE)

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