Mask Aligner, NanoImprint Lithography SÜSS MicroTec MA8/BA8 Gen3 (SUSS-MA8)

CONTACT US

Guarantor: Vojtěch Švarc
Technology / Methodology: Nanolitography infrastructure
Instrument status: Operational Operational, 5.10.2020 10:58, Report any issues with the computer
Equipment placement: CEITEC Nano - C1.30
Research group: CF: CEITEC Nano


Detailed description:

Resist mask preparation for fabrication of nano and microstructures with ultimate dimensions below 50 nm. Includes resist spin coating facility, complete photolithography setup and electron beam lithography / shared by CEITEC users, open facilities


Publications:

  • Gablech, I.; Brodský, J.; Pekárek, J.; Neužil, P., 2020: Infinite selectivity of wet SiO2 etching in respect to Al. MICROMACHINES 11(4), p. 365-1 - 365-7, doi: 10.3390/mi11040365
    (EVAPORATOR, SUSS-MA8, RIE-CHLORINE, DWL, SUSS-RCD8)
  • Gablech, I.; Klempa, J.; Pekárek, J.; Vyroubal, P.; Hrabina, J.; Holá, M.; Kunz, J.; Brodský, J.; Neužil, P., 2020: Simple and Efficient AlN-Based Piezoelectric Energy Harvesters. MICROMACHINES 11(2), p. 143-1 - 143-10, doi: 10.3390/mi11020143
    (DRIE, KAUFMAN, RIE-CHLORINE, WIRE-BONDER, DIENER, DWL, SUSS-MA8, SUSS-RCD8)
  • Chmela, O., 2020: Progress toward the development of single nanowire-based arrays for gas sensing applications. PH.D THESIS , p. 1 - 199
    (ALD, DWL, KAUFMAN, DIENER, SUSS-MA8, SUSS-RCD8, RAITH, MAGNETRON, EVAPORATOR, RIE-FLUORINE, SCIA, DEKTAK, ICON-SPM, NANOCALC, MPS150, WIRE-BONDER)
  • Brodský, J., 2019: Characterization of graphene elecrical properties on MEMS structures. BACHELOR´S THESIS , p. 1 - 50
    (MPS150, WITEC-RAMAN, EVAPORATOR, DRIE, PECVD, DWL, SUSS-MA8, RIE-FLUORINE, RIE-CHLORINE, DIENER, SCIA)
  • Fecko, P., 2019: Gecko mimicking surfaces. MASTER´S THESIS , p. 1 - 52
    (SUSS-RCD8, SUSS-MA8, DWL, DRIE, LYRA, ALD, RIE-FLUORINE, ICON-SPM)

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