Mask Aligner, NanoImprint Lithography SÜSS MicroTec MA8/BA8 Gen3 (SUSS-MA8)

CONTACT US

Guarantor: Vojtěch Švarc, Ph.D.
Technology / Methodology: Nanolitography infrastructure
Instrument status: Operational Operational, 27.5.2025 12:45, Theta TSA axis in the state of observation
Equipment placement: CEITEC Nano - C1.30
Research group: CF: CEITEC Nano


Detailed description:

The Süss MicroTec MA8 is a standard UV lithography tool for exposing wafers through the mask. Exposure can be carried out in proximity mode or in contact mode. The MA8 is equipped with top side optical microscopes and bottom side microscopes, so alignment is possible from both sides of the wafer.


Publications:

  • SUPALOVÁ, L.; BARTOŠÍK, M.; ŠVARC, V.; MACH, J.; PIASTEK, J.; ŠPAČEK, O.; KONEČNÝ, M.; ŠIKOLA, T., 2025: High-Temperature Ultrasensitive FET-Based CVD Graphene Hall Probes. ACS APPLIED ELECTRONIC MATERIALS 7(13), p. 5889 - 9, doi: 10.1021/acsaelm.5c00351; FULL TEXT
    (DWL, SUSS-MA8, EVAPORATOR, MIRA-EBL, RIE-FLUORINE, WIRE-BONDER, WITEC-RAMAN, LYRA)
  • Brodský, J.; Liu, X.; Jarušek, J.; Migliaccio, L.; Neužil, P.; Zítka, O.; Gablech, I., 2025: Determination of ionic concentration in microfluidics using electrical methods. SENSORS AND ACTUATORS A: PHYSICAL 392, p. 1 - 6, doi: 10.1016/j.sna.2025.116719; FULL TEXT
    (SUSS-MA8, RIE-FLUORINE, DRIE)
  • Horký, M., 2025: Controlling the magnetic phase transition in spatially confined structures. PH.D. THESIS , p. 1 - 181; FULL TEXT
    (RAITH, MIRA-EBL, LYRA, TEGRAMIN, SUSS-MA8, DEKTAK, NANOCALC, MAGNETRON, EVAPORATOR, RIE-FLUORINE, WIRE-BONDER, MPS150, CRYOGENIC, LAKESHORE, VERSALAB, ICON-SPM, UHV-PREPARATION, TITAN, HELIOS, VERIOS, RIGAKU3, RIGAKU9)
  • MIGLIACCIO, L.; SAY, M.; PATHAK, G.; GABLECH, I.; BRODSKÝ, J.; DONAHUE, M.; GLOWACKI, E., 2025: Ultrathin Indium Tin Oxide Accumulation Mode Electrolyte-Gated Transistors for Bioelectronics. ADVANCED MATERIALS TECHNOLOGIES , p. 2302219 - 9, doi: 10.1002/admt.202302219; FULL TEXT
    (SUSS-MA8, RIE-FLUORINE, PARYLENE-DIENER, KEITHLEY-4200)
  • NOWAKOWSKA, M.; JAKEŠOVÁ, M.; SCHMIDT, T.; OPANČAR, A.; POLZ, M.; REIMER, R.; FUCHS, J.; PATZ, S.; ZIESEL, D.; SCHERUEBEL, S.; KORNMUELLER, K.; RIENMÜLLER, T.; DEREK, V.; GLOWACKI, E.; SCHINDL, R.; ÜÇAL, M., 2024: Light-Controlled Electric Stimulation with Organic Electrolytic Photocapacitors Achieves Complex Neuronal Network Activation: Semi-Chronic Study in Cortical Cell Culture and Rat Model. ADVANCED HEALTHCARE MATERIALS 13(29), p. 1 - 19, doi: 10.1002/adhm.202401303; FULL TEXT
    (DWL, SUSS-MA8)

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