NIR-UV spectroscopic ellipsometer J. A. Woollam V-VASE (WOOLLAM-VIS)

NIR-UV spectroscopic ellipsometer J. A. Woollam V-VASE
CONTACT US

Guarantor: Alois Nebojsa
Technology / Methodology: Optical measurements
Instrument status: Operational Operational, 20.4.2026 12:14
Equipment placement: CEITEC Nano - C1.21
Research group: CF: CEITEC Nano


Description:

The VASE is most accurate and versatile ellipsometer for research on all types of materials: semiconductors, dielectrics, polymers, metals, multi-layers, and more. It combines high accuracy and precision with a wide spectral range from 193 to 2000nm. Variable wavelength and angle of incidence allow flexible measurement capabilities, absolute transmissivity and light scattering can be also measured.


Publications:

  • Fawaeer, S. H.; Horník, V.; Al-Qaisi, W. M.; Sedláková, V.; Mousa, M. S.; Knápek, A.; Sobola, D., 2026: Oxygen-pressure-tuned phase stability, microstructure, and magnetic properties of BiFeO₃ films on titanium-buffered silicon. SURFACES AND INTERFACES 86, doi: 10.1016/j.surfin.2026.108769; FULL TEXT
    (KRATOS-XPS, RIGAKU3, HELIOS, VERIOS, WOOLLAM-VIS, VERSALAB, ICON-SPM, MAGNETRON)
  • HAJDUČEK, J.; ANDRIEUX, A.; ARREGI URIBEETXEBARRIA, J.; TICHY, M.; CATTANEO, P.; FERRARI, B.; CARBONE, F.; UHLÍŘ, V.; LAGRANGE, T., 2026: Dislocation-driven nucleation type switching across repeated ultrafast magnetostructural phase transition. PHYSICAL REVIEW B 113(1), doi: 10.1103/k8nj-p557; FULL TEXT
    (MAGNETRON, RIGAKU9, VERSALAB, WOOLLAM-VIS)
  • FAWAEER, S.; AL-QAISI, W.; SEDLÁKOVÁ, V.; MOUSA, M.; KNÁPEK, A.; SOBOLA, D., 2026: Non-epitaxial integration of strain-tuned polycrystalline BiFeO3 thin films for silicon-based optoelectronics. OPTICAL MATERIALS 169, doi: 10.1016/j.optmat.2025.117577; FULL TEXT
    (RIGAKU3, VERIOS, ICON-SPM, WOOLLAM-VIS, MAGNETRON, KRATOS-XPS)
  • Pham, N. S.; Hong, N. H., 2025: Modulation of room temperature ferromagnetism in WO3 thin films on low-cost Si wafers. SOLID STATE COMMUNICATIONS 397, doi: 10.1016/j.ssc.2024.115807; FULL TEXT
    (LYRA, VERSALAB, RIGAKU3, ICON-SPM, WOOLLAM-VIS, KRATOS-XPS)
  • JANŮŠOVÁ, M.; NEČAS, D.; NAVASCUES, P.; HEGEMANN, D.; GAVRANOVIĆ, S.; ZAJÍČKOVÁ, L., 2025: Insight into plasma polymerization with a significant contribution of etching to the deposition process. SURFACE & COATINGS TECHNOLOGY 503, doi: 10.1016/j.surfcoat.2025.131962; FULL TEXT
    (DEKTAK, WOOLLAM-VIS, KRATOS-XPS)

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