NIR-UV spectroscopic ellipsometer J. A. Woollam V-VASE (WOOLLAM-VIS)

NIR-UV spectroscopic ellipsometer J. A. Woollam V-VASE
CONTACT US

Guarantor: Alois Nebojsa
Technology / Methodology: Optical measurements
Instrument status: Operational Operational, 3.10.2025 14:15
Equipment placement: CEITEC Nano - C1.21
Research group: CF: CEITEC Nano


Description:

The VASE is most accurate and versatile ellipsometer for research on all types of materials: semiconductors, dielectrics, polymers, metals, multi-layers, and more. It combines high accuracy and precision with a wide spectral range from 193 to 2000nm. Variable wavelength and angle of incidence allow flexible measurement capabilities, absolute transmissivity and light scattering can be also measured.


Publications:

  • Fawaeer, S. H.; Al-Qaisi, W. M.; Sedláková, V.; Mousa, M. S.; Knápek, A.; Sobola, D., 2026: Non-epitaxial integration of strain-tuned polycrystalline BiFeO3 thin films for silicon-based optoelectronics. OPTICAL MATERIALS 169, doi: 10.1016/j.optmat.2025.117577; FULL TEXT
    (RIGAKU3, KRATOS-XPS, VERIOS, ICON-SPM, WOOLLAM-VIS, MAGNETRON)
  • Hajduček, J.; Andrieux, A.; Arregi, J. A.; Tichý, M.; Cattaneo, P.; Ferrari, B.; Carbone, F.; Uhlíř, V.; LaGrange, T., 2026: Dislocation-driven nucleation type switching across repeated ultrafast magnetostructural phase transition. PHYSICAL REVIEW B 113(1), doi: 10.1103/k8nj-p557; FULL TEXT
    (MAGNETRON, RIGAKU9, VERSALAB, WOOLLAM-VIS)
  • Pham, N. S.; Huong, N. Q.; Pazourek, P.; Meduna, M.; Caha, O.; Hong, N. H., 2025: Pristine SnO2 thin films: origins of high Curie temperature. APPLIED PHYSICS A 131(11), doi: 10.1007/s00339-025-09031-7; FULL TEXT
    (LYRA, WOOLLAM-VIS, KRATOS-XPS, CRYOGENIC)
  • Franta, D.; Vohánka, J.; Dvořák, J.; Franta, P.; Ohlídal, I.; Klapetek, P.; Březina, J.; Škoda, D., 2025: Wide spectral range optical characterization of tantalum pentoxide (Ta 2 O 5 ) films by the universal dispersion model. OPTICAL MATERIALS EXPRESS 15(4), doi: 10.1364/OME.550708; FULL TEXT
    (WOOLLAM-MIR, WOOLLAM-VIS, VUVAS)
  • JANŮŠOVÁ, M.; NEČAS, D.; NAVASCUES, P.; HEGEMANN, D.; GAVRANOVIĆ, S.; ZAJÍČKOVÁ, L., 2025: Insight into plasma polymerization with a significant contribution of etching to the deposition process. SURFACE & COATINGS TECHNOLOGY 503, doi: 10.1016/j.surfcoat.2025.131962; FULL TEXT
    (KRATOS-XPS, DEKTAK, WOOLLAM-VIS)

Show more publications...