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Optical characterization of SiO2 thin films using universal dispersion model over wide spectral range

OPTICAL MICRO- AND NANOMETROLOGY VI

Franta, D; Necas, D; Ohlidal, I; Giglia, A, 2016: Optical characterization of SiO2 thin films using universal dispersion model over wide spectral range. OPTICAL MICRO- AND NANOMETROLOGY VI 9890, doi: 10.1117/12.2227580

CEITEC authors:

• David Nečas, Ph.D.