Scanning Electron Microscope/E-beam writer TESCAN MIRA3Raith LIS (MIRA-EBL)

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Guarantor: Vojtěch Švarc, Ph.D.
Technology / Methodology: Probe microscopy & Nanomanipulation
Instrument status: Operational Operational, 7.11.2024 22:51
Equipment placement: CEITEC Nano - C1.29
Research group: CF: CEITEC Nano


Description:

SEM is a type of microscope where a focused beam of electrons is scanned over the sample to generate an image or to modify the sample surface in nanometric resolution (usually better than 10 nm). The sample image is generated by detecting secondary and backscattered electrons emitted from the impact location of the beam. The tool is preferred for e-beam lithography, where the resist-coated sample is selectively exposed to the electron beam, allowing the preparation of very small patterns (< 50 nm and less) in the resistant surface. There can be further processing of the sample by wet chemistry (development, stripping). An interferometric stage can also be used to achieve ultimate resolution of electron beam lithography over a large area and to join more fields together.


Publications:

  • Dodd, S.; Gudino, N.; Zadorozhnii, O.; Stano, M.; Hajducek, J.; Arregi, JA.; Morris, HD.; Uhlir, V.; Barbic, M.; Koretsky, AP., 2025: Field switching of microfabricated metamagnetic FeRh MRI contrast agents. SCIENTIFIC REPORTS 15(1), doi: 10.1038/s41598-025-85384-6; FULL TEXT
    (MAGNETRON, VERSALAB, MIRA-EBL, EVAPORATOR, RIE-FLUORINE, ICON-SPM, KERR-MICROSCOPE)
  • TAKHSHA GHAHFAROKHI, M.; HORKÝ, M.; NASI, L.; KOSOGOR, A.; TREVISI, G.; CASOLI, F.; ARREGI URIBEETXEBARRIA, J.; BRESCIA, R.; UHLÍŘ, V.; ALBERTINI, F., 2025: Spatially confined magnetic shape-memory Heuslers: Implications for nanoscale devices. ACTA MATERIALIA 284, p. 1 - 11, doi: 10.1016/j.actamat.2024.120579; FULL TEXT
    (VERIOS, MIRA-EBL, RIE-FLUORINE, VERSALAB, WIRE-BONDER)
  • KOVAŘÍK, M.; CITTERBERG, D.; PAIVA DE ARAÚJO, E.; ŠIKOLA, T.; KOLÍBAL, M., 2024: Understanding the Effect of Electron Irradiation on WS2 Nanotube Devices to Improve Prototyping Routines. ACS APPLIED ELECTRONIC MATERIALS 6(12), p. 8776 - 7, doi: 10.1021/acsaelm.4c01450; FULL TEXT
    (ALD, MIRA-EBL, EVAPORATOR, MPS150, KEITHLEY-4200, LYRA, LITESCOPE-LYRA, WITEC-RAMAN, WIRE-BONDER)
  • BRODSKÝ, J.; GABLECH, I.; MIGLIACCIO, L.; HAVLÍČEK, M.; DONAHUE, M.; GLOWACKI, E., 2023: Downsizing the Channel Length of Vertical Organic Electrochemical Transistors. ACS APPL MATER INTER 15(22), p. 27002 - 8, doi: 10.1021/acsami.3c02049; FULL TEXT
    (SUSS-MA8, EVAPORATOR, SCIA, PARYLENE-SCS, RIE-FLUORINE, MIRA-EBL, DEKTAK, ICON-SPM)
  • GALLINA, P.; KVAPIL, M.; LIŠKA, J.; KONEČNÁ, A.; KŘÁPEK, V.; KALOUSEK, R.; ZLÁMAL, J.; ŠIKOLA, T., 2023: Strong coupling in an Au plasmonic antenna-SiO2 layer system: A hybrid-mode analysis. PHYSICAL REVIEW B 107(12), p. 125144 - 6, doi: 10.1103/PhysRevB.107.125144; FULL TEXT
    (ALD, EVAPORATOR, MIRA-EBL, FTIR, NANOCALC, DEKTAK, WOOLLAM-MIR, ICON-SPM)

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