Scanning Electron Microscope/E-beam writer TESCAN MIRA3Raith LIS (MIRA-EBL)

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Guarantor: Vojtěch Švarc, Ph.D.
Technology / Methodology: Probe microscopy & Nanomanipulation
Instrument status: Operational Operational, 16.7.2025 17:18
Equipment placement: CEITEC Nano - C1.29
Research group: CF: CEITEC Nano


Description:

SEM is a type of microscope where a focused beam of electrons is scanned over the sample to generate an image or to modify the sample surface in nanometric resolution (usually better than 10 nm). The sample image is generated by detecting secondary and backscattered electrons emitted from the impact location of the beam. The tool is preferred for e-beam lithography, where the resist-coated sample is selectively exposed to the electron beam, allowing the preparation of very small patterns (< 50 nm and less) in the resistant surface. There can be further processing of the sample by wet chemistry (development, stripping). An interferometric stage can also be used to achieve ultimate resolution of electron beam lithography over a large area and to join more fields together.


Publications:

  • PENG, X.; ORAL, Ç.; URSO, M.; USSIA, M.; PUMERA, M., 2025: Active Microrobots for Dual Removal of Biofilms via Chemical and Physical Mechanisms. ACS APPLIED MATERIALS & INTERFACES , p. 3608 - 3619, doi: 10.1021/acsami.4c18360; FULL TEXT
    (MIRA-EBL, KRATOS-XPS, VERSALAB)
  • JANČÍK PROCHÁZKOVÁ, A.; MICHÁLKOVÁ, H.; ČÍHALOVÁ, K.; HEGER, Z.; PUMERA, M., 2025: Microrobots for Antibiotic-Resistant Staphylococcus aureus Skin Colony Eradication. ACS APPLIED MATERIALS & INTERFACES 17(27), p. 39340 - 39348, doi: 10.1021/acsami.5c08683; FULL TEXT
    (LEICACOAT-STAN, RIGAKU3, MIRA-EBL)
  • DAVÍDKOVÁ, K.; LEVCHENKO, K.; SERHA, R.; BRUCKNER, F.; LINDNER, M.; DUBS, C.; URBÁNEK, M.; SUESS, D.; WANG, Q.; VERBA, R.; CHUMAK, A., 2025: Spin-wave microscale RF delay lines for mid- and high-frequency 5G band. JOURNAL OF APPLIED PHYSICS 138(14), p. 1 - 14, doi: 10.1063/5.0286108; FULL TEXT
    (VNA-MPI, MIRA-EBL, EVAPORATOR)
  • SUPALOVÁ, L.; BARTOŠÍK, M.; ŠVARC, V.; MACH, J.; PIASTEK, J.; ŠPAČEK, O.; KONEČNÝ, M.; ŠIKOLA, T., 2025: High-Temperature Ultrasensitive FET-Based CVD Graphene Hall Probes. ACS APPLIED ELECTRONIC MATERIALS 7(13), p. 5889 - 5897, doi: 10.1021/acsaelm.5c00351; FULL TEXT
    (DWL, SUSS-MA8, EVAPORATOR, MIRA-EBL, RIE-FLUORINE, WIRE-BONDER, WITEC-RAMAN, LYRA)
  • TAKHSHA GHAHFAROKHI, M.; HORKÝ, M.; NASI, L.; KOSOGOR, A.; TREVISI, G.; CASOLI, F.; ARREGI URIBEETXEBARRIA, J.; BRESCIA, R.; UHLÍŘ, V.; ALBERTINI, F., 2025: Spatially confined magnetic shape-memory Heuslers: Implications for nanoscale devices. ACTA MATERIALIA 284, p. 1 - 11, doi: 10.1016/j.actamat.2024.120579; FULL TEXT
    (VERIOS, MIRA-EBL, RIE-FLUORINE, VERSALAB, WIRE-BONDER)

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