Scanning Electron Microscope/E-beam writer TESCAN MIRA3Raith LIS (MIRA-EBL)

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Guarantor: Vojtěch Švarc, Ph.D.
Technology / Methodology: Probe microscopy & Nanomanipulation
Instrument status: Operational Operational, 16.7.2025 17:18
Equipment placement: CEITEC Nano - C1.29
Research group: CF: CEITEC Nano


Description:

SEM is a type of microscope where a focused beam of electrons is scanned over the sample to generate an image or to modify the sample surface in nanometric resolution (usually better than 10 nm). The sample image is generated by detecting secondary and backscattered electrons emitted from the impact location of the beam. The tool is preferred for e-beam lithography, where the resist-coated sample is selectively exposed to the electron beam, allowing the preparation of very small patterns (< 50 nm and less) in the resistant surface. There can be further processing of the sample by wet chemistry (development, stripping). An interferometric stage can also be used to achieve ultimate resolution of electron beam lithography over a large area and to join more fields together.


Publications:

  • Wang, Y.; Guo, M.; Davídková, K.; Verba, R.; Guo, X.; Dubs, C.; Chumak, A. V.; Pirro, P.; Wang, Q., 2025: Fast switchable unidirectional forward volume spin-wave emitter. PHYSICAL REVIEW APPLIED 23(1), p. 1 - 10, doi: 10.1103/PhysRevApplied.23.014066; FULL TEXT
    (MIRA-EBL, RIE-FLUORINE, SCIA, EVAPORATOR)
  • DODD, S.; GUDINO, N.; ZADOROZHNII, O.; STAŇO, M.; HAJDUČEK, J.; ARREGI URIBEETXEBARRIA, J.; MORRIS, H.; UHLÍŘ, V.; BARBIC, M.; KORETSKY, A., 2025: Field switching of microfabricated metamagnetic FeRh MRI contrast agents. SCIENTIFIC REPORTS 15(1), p. 1 - 10, doi: 10.1038/s41598-025-85384-6; FULL TEXT
    (MAGNETRON, VERSALAB, MIRA-EBL, EVAPORATOR, RIE-FLUORINE, ICON-SPM, KERR-MICROSCOPE)
  • TAKHSHA GHAHFAROKHI, M.; HORKÝ, M.; NASI, L.; KOSOGOR, A.; TREVISI, G.; CASOLI, F.; ARREGI URIBEETXEBARRIA, J.; BRESCIA, R.; UHLÍŘ, V.; ALBERTINI, F., 2025: Spatially confined magnetic shape-memory Heuslers: Implications for nanoscale devices. ACTA MATERIALIA 284, p. 1 - 11, doi: 10.1016/j.actamat.2024.120579; FULL TEXT
    (VERIOS, MIRA-EBL, RIE-FLUORINE, VERSALAB, WIRE-BONDER)
  • KOVAŘÍK, M.; CITTERBERG, D.; PAIVA DE ARAÚJO, E.; ŠIKOLA, T.; KOLÍBAL, M., 2024: Understanding the Effect of Electron Irradiation on WS2 Nanotube Devices to Improve Prototyping Routines. ACS APPLIED ELECTRONIC MATERIALS 6(12), p. 8776 - 7, doi: 10.1021/acsaelm.4c01450; FULL TEXT
    (ALD, MIRA-EBL, EVAPORATOR, MPS150, KEITHLEY-4200, LYRA, LITESCOPE-LYRA, WITEC-RAMAN, WIRE-BONDER)
  • LAMB-CAMARENA, S.; PORRATI, F.; KUPRAVA, A.; WANG, Q.; URBÁNEK, M.; BARTH, S.; MAKAROV, D.; HUTH, M.; DOBROVOLSKIY, O., 2023: 3D Magnonic Conduits by Direct Write Nanofabrication. NANOMATERIALS 13(13), doi: 10.3390/nano13131926; FULL TEXT
    (MIRA-EBL, EVAPORATOR, BRILLOUIN)

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