Tetrakis(trimethylsilyloxy)silane for nanostructured SiO2-like films deposited by PECVD at atmospheric pressure

SURFACE & COATINGS TECHNOLOGY

Schafer, J; Hnilica, J; Sperka, J; Quade, A; Kudrle, V; Foest, R; Vodak, J; Zajickova, L, 2016: Tetrakis(trimethylsilyloxy)silane for nanostructured SiO2-like films deposited by PECVD at atmospheric pressure. SURFACE & COATINGS TECHNOLOGY 295, p. 112 - 118, doi: 10.1016/j.surfcoat.2015.09.047

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