Ultra High Vacuum Preparation and Analytical System - Scanning Probe Microscopy SPECS Aarhus 150 SPM (UHV-SPM)

Description:

The chamber for STM and AFM scanning probe techniques (UHV-SPM) is one of the instruments of the UHV-Cluster, which combines preparation and in-situ analysis by several complementary methods for the characterization of surfaces and thin films. The UHV-SPM is equipped with the SPM Aarhus 150 working in of range 90–400K and provides the possibility of Scanning Tunneling Microscopy (STM) and Atomic Force Microscopy (AFM), achieving an atomic resolution on metal, semiconductor, and oxide surfaces.

Publications:

• Procházka, P.; Frezza, F.; Sánchez‐Grande, A.; Carrera, M.; Chen, Q.; Stará, V.; Kurowská, A.; Curiel, D.; Jelínek, P.; Čechal, J., 2025: Monitoring On‐Surface Chemical Reactions by Low‐Energy Electron Microscopy: from Conformation Change to Ring Closure in 2D Molecular Gas. CHEMISTRY – A EUROPEAN JOURNAL 31(20), p. 1 - 6, doi: 10.1002/chem.202500561; FULL TEXT
  (UHV-LEEM, UHV-SPM, UHV-DEPOSITION, UHV-PREPARATION)
• Jakub, Z.; Planer, J.; Hrůza, D.; Shahsavar, A.; Pavelec, J.; Čechal, J., 2025: Identical Fe-N4 Sites with Different Reactivity: Elucidating the Effect of Support Curvature. ACS APPLIED MATERIALS & INTERFACES 17(6), p. 10136 - 10144, doi: 10.1021/acsami.4c19913; FULL TEXT
  (UHV-CLUSTER, UHV-DEPOSITION, UHV-PREPARATION, UHV-SPM, UHV-XPS)
• KRAJŇÁK, T.; STARÁ, V.; PROCHÁZKA, P.; PLANER, J.; SKÁLA, T.; BLATNIK, M.; ČECHAL, J., 2024: Robust Dipolar Layers between Organic Semiconductors and Silver for Energy-Level Alignment. ACS APPLIED MATERIALS & INTERFACES 16(14), p. 18099 - 13, doi: 10.1021/acsami.3c18697; FULL TEXT
  (UHV-LEEM, UHV-XPS, UHV-PREPARATION, UHV-SPM, UHV-DEPOSITION)
• JAKUB, Z.; TRLLOVÁ SHAHSAVAR, A.; PLANER, J.; HRŮZA, D.; HERICH, O.; PROCHÁZKA, P.; ČECHAL, J., 2024: How the Support Defines Properties of 2D Metal-Organic Frameworks: Fe-TCNQ on Graphene versus Au(111). JOURNAL OF THE AMERICAN CHEMICAL SOCIETY 146(5), p. 3471 - 12, doi: 10.1021/jacs.3c13212; FULL TEXT
  (UHV-DEPOSITION, UHV-LEEM, UHV-XPS, UHV-PREPARATION, UHV-SPM)
• Kurowská, A., 2023: 2D metal-organic frameworks from organic carbonitrile molecules on weakly interacting substrates. MASTER´S THESIS , p. 1 - 61; FULL TEXT
  (UHV-LEEM, UHV-MBE, UHV-PREPARATION, UHV-SPM, UHV-XPS)

• PROCHÁZKA, P.; ČECHAL, J., 2023: Visualization of molecular stacking using low-energy electron microscopy. ULTRAMICROSCOPY 253, doi: 10.1016/j.ultramic.2023.113799; FULL TEXT
  (UHV-DEPOSITION, UHV-LEEM, UHV-PREPARATION, UHV-SPM)
• Makoveev, A. O., 2023: Molecular self-assembly on surfaces: the role of coverage, surface orientation and kinetics. PH.D. THESIS , p. 1 - 169; FULL TEXT
  (UHV-DEPOSITION, UHV-LEEM, UHV-XPS, UHV-PREPARATION, UHV-SPM)
• Jeřábek, F., 2023: Microscopic and spectroscopic analysis of elementary 2D materials. BACHELOR´S THESIS , p. 1 - 42; FULL TEXT
  (UHV-DEPOSITION, UHV-PREPARATION, UHV-LEEM, UHV-SPM)
• David, J., 2023: Preparation of elementary 2D materials and heterostructures. MASTER´S THESIS , p. 1 - 69; FULL TEXT
  (UHV-DEPOSITION, UHV-PREPARATION, UHV-LEEM, UHV-XPS, UHV-SPM)
• MAKOVEEV, A.; PROCHÁZKA, P.; SHAHSAVAR, A.; KORMOŠ, L.; KRAJŇÁK, T.; STARÁ, V.; ČECHAL, J., 2022: Kinetic control of self-assembly using a low-energy electron beam. APPLIED SURFACE SCIENCE 600, p. 154106 - 7, doi: 10.1016/j.apsusc.2022.154106; FULL TEXT
  (UHV-DEPOSITION, UHV-LEEM, UHV-XPS, UHV-PREPARATION, UHV-SPM)
• STARÁ, V.; PROCHÁZKA, P.; PLANER, J.; SHAHSAVAR, A.; MAKOVEEV, A.; SKÁLA, T.; BLATNIK, M.; ČECHAL, J., 2022: Tunable Energy-Level Alignment in Multilayers of Carboxylic Acids on Silver. PHYSICAL REVIEW APPLIED 18(4), doi: 10.1103/PhysRevApplied.18.044048; FULL TEXT
  (UHV-DEPOSITION, UHV-PREPARATION, UHV-LEEM, UHV-SPM, UHV-XPS)
• JAKUB, Z.; KUROWSKÁ, A.; HERICH, O.; ČERNÁ, L.; KORMOŠ, L.; SHAHSAVAR, A.; PROCHÁZKA, P.; ČECHAL, J., 2022: Remarkably stable metal-organic frameworks on an inert substrate: M-TCNQ on graphene (M = Ni, Fe, Mn). NANOSCALE 14(26), p. 9507 - 9, doi: 10.1039/d2nr02017c; FULL TEXT
  (UHV-DEPOSITION, UHV-LEEM, UHV-XPS, UHV-PREPARATION, UHV-SPM)
• MAKOVEEV, A.; PROCHÁZKA, P.; BLATNIK, M.; KORMOŠ, L.; SKÁLA, T.; ČECHAL, J., 2022: Role of Phase Stabilization and Surface Orientation in 4,4 ´-Biphenyl-Dicarboxylic Acid Self-Assembly and Transformation on Silver Substrates. JOURNAL OF PHYSICAL CHEMISTRY C (WEB) 126(23), p. 9989 - 9, doi: 10.1021/acs.jpcc.2c02538; FULL TEXT
  (UHV-PREPARATION, UHV-DEPOSITION, UHV-LEEM, UHV-SPM, UHV-XPS)
• Kormoš, L., 2021: 2D molecular systems at surfaces. PH.D. THESIS , p. 1 - 140; FULL TEXT
  (UHV-DEPOSITION, UHV-PREPARATION, UHV-XPS, UHV-LEEM, UHV-SPM, EVAPORATOR)
• PROCHÁZKA, P.; KORMOŠ, L.; SHAHSAVAR, A.; STARÁ, V.; MAKOVEEV, A.; SKÁLA, T.; BLATNIK, M.; ČECHAL, J., 2021: Phase transformations in a complete monolayer of 4,4 ´-biphenyl-dicarboxylic acid on Ag(001). APPLIED SURFACE SCIENCE 547, p. 149115- - 7, doi: 10.1016/j.apsusc.2021.149115; FULL TEXT
  (UHV-DEPOSITION, UHV-PREPARATION, UHV-SPM, UHV-XPS, UHV-LEEM)
• PROCHÁZKA, P.; GOSALVEZ, M.; KORMOŠ, L.; DE LA TORRE, B.; GALLARDO, A.; ALBERDI-RODRIGUEZ, J.; CHUTORA, T.; MAKOVEEV, A.; SHAHSAVAR, A.; ARNAU, A.; JELÍNEK, P.; ČECHAL, J., 2020: Multiscale Analysis of Phase Transformations in Self-Assembled Layers of 4,4 ´-Biphenyl Dicarboxylic Acid on the Ag(001) Surface. ACS NANO 14(6), p. 7269 - 11, doi: 10.1021/acsnano.0c02491; FULL TEXT
  (UHV-LEEM, UHV-SPM, UHV-XPS, UHV-PREPARATION, UHV-DEPOSITION)
• UHLÍŘ, V.; PRESSACCO, F.; ARREGI URIBEETXEBARRIA, J.; PROCHÁZKA, P.; PRŮŠA, S.; POTOČEK, M.; ŠIKOLA, T.; ČECHAL, J.; BENDOUNAN, A.; SIROTTI, F., 2020: Single-layer graphene on epitaxial FeRh thin films. APPLIED SURFACE SCIENCE 514, p. 145923-1 - 7, doi: 10.1016/j.apsusc.2020.145923; FULL TEXT
  (MAGNETRON, VERSALAB, RIGAKU9, UHV-LEEM, UHV-LEIS, UHV-SPM, UHV-PREPARATION, UHV-XPS, SIMS)
• KORMOŠ, L.; PROCHÁZKA, P.; MAKOVEEV, A.; ČECHAL, J., 2020: Complex k-uniform tilings by a simple bitopic precursor self-assembled on Ag(001) surface. NATURE COMMUNICATIONS 11(1), p. 1 - 6, doi: 10.1038/s41467-020-15727-6; FULL TEXT
  (UHV-DEPOSITION, UHV-PREPARATION, UHV-LEEM, UHV-SPM, UHV-XPS)
• KORMOŠ, L.; PROCHÁZKA, P.; ŠIKOLA, T.; ČECHAL, J., 2018: Molecular Passivation of Substrate Step Edges as Origin of Unusual Growth Behavior of 4,4´-Biphenyl Dicarboxylic Acid on Cu(001). JOURNAL OF PHYSICAL CHEMISTRY C (PRINT) 122(5), p. 2815 - 6, doi: 10.1021/acs.jpcc.7b11436; FULL TEXT
  (UHV-SPM, UHV-LEEM, UHV-PREPARATION)
• Makoveev, A., 2018: Functional properties of 2D supramolecular nanoarchitectures. TREATISE TO STATE DOCTORAL EXAM , p. 1 - 32
  (UHV-LEEM, UHV-MBE, UHV-XPS, UHV-PREPARATION, UHV-SPM)
• Horký, M., 2016: Growth of Metastable FCC FE Thin Films on Cu(100)/Si(100) Substrates. MASTER´S THESIS , p. 1 - 96
  (UHV-PREPARATION, UHV-XPS, UHV-SPM, VERIOS, UHV-LEIS, KRATOS-XPS, RIGAKU3, LYRA, ICON-SPM)

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