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Infinite selectivity of wet SiO2 etching in respect to Al

MICROMACHINES

GABLECH, I.; BRODSKÝ, J.; PEKÁREK, J.; NEUŽIL, P., 2020: . MICROMACHINES 11(4), p. 365 - 7, doi: 10.3390/mi11040365; FULL TEXT
(EVAPORATOR, SUSS-MA8, RIE-CHLORINE, DWL, SUSS-RCD8)

Equipment:

• Electron beam evaporator BESTEC
• Mask Aligner, NanoImprint Lithography SÜSS MicroTec MA8/BA8 Gen3
• RIE by Chlorine Chemistry Oxford Instruments Plasma Technology PlasmaPro 100
• UV Direct Write Laser system Heidelberg Instruments DWL 66-fs
• Resist coating and development system SÜSS MicroTec RCD8

Research Groups:

• CF: CEITEC Nano

CEITEC authors:

• Prof. Pavel Neužil
• Imrich Gablech, Ph.D.
• Jan Brodský, Ph.D.