Fabrication of buried microfluidic channels with observation windows using femtosecond laser photoablation and parylene-C coating
Microfluidics and Nanofluidics
Gablech, I; Somer, J; Fohlerova, Z; Svatos, V; Pekarek, J; Kurdik, S; Feng, JG; Fecko, P; Podesva, P; Hubalek, J; Neuzil, P, 2018: Fabrication of buried microfluidic channels with observation windows using femtosecond laser photoablation and parylene-C coating. MICROFLUIDICS AND NANOFLUIDICS 22(9), doi: 10.1007/s10404-018-2125-6
(DRIE, DWL, SUSS-MA8, PARYLENE, XEF2)
Equipment:
- Deep reactive ion etching of Si-based materials Oxford Instruments Plasma Technology PlasmaPro 100
- UV Direct Write Laser system Heidelberg Instruments DWL 66-fs
- Mask Aligner, NanoImprint Lithography SÜSS MicroTec MA8/BA8 Gen3
- SCS Parylene Deposition System
- XeF2 Etching of Silicon
Research Groups:
CEITEC authors: