Fabrication of buried microfluidic channels with observation windows using femtosecond laser photoablation and parylene-C coating

Microfluidics and Nanofluidics

Gablech, I; Somer, J; Fohlerova, Z; Svatos, V; Pekarek, J; Kurdik, S; Feng, JG; Fecko, P; Podesva, P; Hubalek, J; Neuzil, P, 2018: Fabrication of buried microfluidic channels with observation windows using femtosecond laser photoablation and parylene-C coating. MICROFLUIDICS AND NANOFLUIDICS 22(9), doi: 10.1007/s10404-018-2125-6
(DRIE, DWL, SUSS-MA8, PARYLENE, XEF2)

Equipment:

• Deep reactive ion etching of Si-based materials Oxford Instruments Plasma Technology PlasmaPro 100
• UV Direct Write Laser system Heidelberg Instruments DWL 66-fs
• Mask Aligner, NanoImprint Lithography SÜSS MicroTec MA8/BA8 Gen3
• SCS Parylene Deposition System
• XeF2 Etching of Silicon

Research Groups:

• Smart Nanodevices - Vojtěch Adam
• CF: CEITEC Nano
• Advanced Ceramic Materials - Martin Trunec

CEITEC authors:

• Imrich Gablech, Ph.D.
• Zdenka Fohlerová, Ph.D.
• Jaromír Hubálek, Ph.D.
• Peter Fecko
• Prof. Pavel Neužil