Ambipolar remote graphene doping by low-energy electron beam irradiation
NANOSCALE
STARÁ, V.; PROCHÁZKA, P.; MAREČEK, D.; ŠIKOLA, T.; ČECHAL, J., 2018: Ambipolar remote graphene doping by low-energy electron beam irradiation. NANOSCALE 10(37), p. 17520 - 5, doi: 10.1039/c8nr06483k; FULL TEXT
(ALD, DIENER, DWL, EVAPORATOR)
Equipment:
- Atomic layer deposition system Ultratech/CambridgeNanoTech Fiji 200
- Resist stripper Diener electronic NANO Plasma cleaner
- UV Direct Write Laser system Heidelberg Instruments DWL 66-fs
- Electron beam evaporator BESTEC
Research Groups:
- Fabrication and Characterisation of Nanostructures
- CF: CEITEC Nano
- Molecular Nanostructures at Surfaces
CEITEC authors: