Step-edge assisted large scale FeSe monolayer growth on epitaxial Bi_2 Se_3 thin films
NEW JOURNAL OF PHYSICS
Fikáček, J.; Procházka, P.; Stetsovych, V.; Průša, S.; Vondráček, M.; Kormoš, L.; Skála, T.; Vlaic, P.; Caha, O.; Carva, K.; Čechal, J.; Springholz, G.; Honolka, J., 2020: Step-edge assisted large scale FeSe monolayer growth on epitaxial Bi_2 Se_3 thin films. NEW JOURNAL OF PHYSICS 22(7), p. 073050-1 - 073050-12, doi: 10.1088/1367-2630/ab9b59
(UHV-LEEM, UHV-XPS, UHV-LEIS, UHV-DEPOSITION, UHV-PREPARATION)
Equipment:
- Ultra High Vacuum Preparation and Analytical System - Low Energy Electron Microscope SPECS FE-LEEM P90
- Ultra High Vacuum Preparation and Analytical system - Photoelectron Spectroscopy SPECS Phoibos 150
- Ultra High Vacuum Preparation and Analytical System - Low Energy Ion Spectroscopy ION-TOF Qtac 100
- Ultra High Vacuum Preparation and Analytical System - Custom Deposition Chamber SPECS
- Ultra High Vacuum Preparation and Analytical System - Preparation Chamber SPECS
Research Groups:
- Fabrication and Characterisation of Nanostructures - Tomáš Šikola
- CF: CEITEC Nano
- Molecular Nanostructures at Surfaces - Jan Čechal
CEITEC authors: