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Mechanical strain and electric-field modulation of graphene transistors integrated on MEMS cantilevers
JOURNAL OF MATERIALS SCIENCE
GABLECH, I.; BRODSKÝ, J.; VYROUBAL, P.; PIASTEK, J.; BARTOŠÍK, M.; PEKÁREK, J., 2022: Mechanical strain and electric-field modulation of graphene transistors integrated on MEMS cantilevers. JOURNAL OF MATERIALS SCIENCE 57(3), p. 1923 - 13, doi: 10.1007/s10853-021-06846-6; FULL TEXT
(RIE-FLUORINE, DRIE, EVAPORATOR, WIRE-BONDER, WITEC-RAMAN, MPS150, KEITHLEY-4200, SUSS-MA8, DWL)
Equipment:
- RIE by F Chemistry and PECVD of hard C-based films Oxford Instruments Plasma Technology PlasmaPro 80
- Deep reactive ion etching of Si-based materials Oxford Instruments Plasma Technology PlasmaPro 100
- Electron beam evaporator BESTEC
- Wire bonder TPT HB 16
- Witec Alpha 300R
- 4-probe station Cascade Microtech MPS 150
- Keithley 4200-SCS Parameter Analyzer
- Mask Aligner, NanoImprint Lithography SÜSS MicroTec MA8/BA8 Gen3
- UV Direct Write Laser system Heidelberg Instruments DWL 66-fs
Research Groups:
- CF: CEITEC Nano
- Fabrication and Characterisation of Nanostructures
- Bioelectronics Materials and Devices
CEITEC authors: