Atomic layer deposition of titanium dioxide on multi-walled carbon nanotubes for ammonia gas sensing

Surface and Coatings Technology

Kaushik, P.; Eliáš, M.; Michalička, J.; Hegemann, D.; Pytlíček, Z.; Nečas, D.; Zajíčková, L., 2019: Atomic layer deposition of titanium dioxide on multi-walled carbon nanotubes for ammonia gas sensing. SURFACE AND COATINGS TECHNOLOGY 370, p. 235 - 243, doi: 10.1016/j.surfcoat.2019.04.031
(ALD, EVAPORATOR, PECVD-NANOFAB, WOOLLAM-VIS, RIGAKU3, KRATOS-XPS, VERIOS, TITAN)

Equipment:

• Atomic layer deposition system Ultratech/CambridgeNanoTech Fiji 200
• Electron beam evaporator BESTEC
• High temperature plasma enhanced chemical vapour deposition system on C-based materials Oxford Instruments Plasma Technology NanoFab
• NIR-UV spectroscopic ellipsometer J. A. Woollam V-VASE
• X-ray powder diffractometer Rigaku SmartLab 3kW
• X-ray Photoelectron Spectroscopy Kratos Analytical Axis Supra
• High resolution Scanning Electron Microscope FEI Verios 460L
• High resolution (scanning) Transmission Electron Microscope FEI Titan Themis 60-300 cubed

Research Groups:

• CF: CEITEC Nano
• Plasma Technologies - Lenka Zajíčková
• Smart Nanodevices - Jaromír Hubálek

CEITEC authors:

• Marek Eliáš, Ph.D.
• Jan Michalička
• Zdeněk Pytlíček, Ph.D.
• David Nečas, Ph.D.
• Lenka Zajíčková, Ph.D.
• Preeti Kaushik