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Comparison of on-chip MIS capacitors based on stacked HfO2/Al2O3 nanolaminates
MATERIALS TODAY COMMUNICATIONS
KARTCI, A.; VANČÍK, S.; PRÁŠEK, J.; HRDÝ, R.; SCHNEIDER, M.; SCHMID, U.; HUBÁLEK, J., 2022: Comparison of on-chip MIS capacitors based on stacked HfO2/Al2O3 nanolaminates. MATERIALS TODAY COMMUNICATIONS 33, p. 1 - 8, doi: 10.1016/j.mtcomm.2022.104664; FULL TEXT
(ALD, EVAPORATOR, SUSS-MA8, SUSS-RCD8, MAGNETRON, TITAN, MPS150, KEITHLEY-4200, SUMMIT, KRATOS-XPS)
Equipment:
- Atomic layer deposition system Ultratech/CambridgeNanoTech Fiji 200
- Electron beam evaporator BESTEC
- Mask Aligner, NanoImprint Lithography SÜSS MicroTec MA8/BA8 Gen3
- Resist coating and development system SÜSS MicroTec RCD8
- Magnetron sputtering system BESTEC
- High-resolution (scanning) Transmission Electron Microscope FEI Titan Themis 60-300 cubed
- 4-probe station Cascade Microtech MPS 150
- Keithley 4200-SCS Parameter Analyzer
- Semi-automated 4-probe system Cascade Microtech SUMMIT 12000
- X-ray Photoelectron Spectroscopy Axis Supra
Research Groups:
CEITEC authors: